Nanoimprint lithography for replicating focused ion beam structures: evaluation of structural fidelity

Focused Ion Beam (FIB) is a precise micro- and nanofabrication technique widely used in the fields of photonics, the semiconductor industry, and materials science. However, using FIB is time-consuming and costly, especially for largescale patterning or mass production. To address this, we combine FIB and Nanoimprint Lithography (NIL) to enable fast and accurate replication of structures. The aim of this work is to evaluate NIL structures replicated from FIB-fabricated masters. Diffractive optical elements are first created using FIB, then replicated using NIL. Topographic characterization i.e., topographic measurements is carried out to assess the fidelity of the NIL method. This study demonstrates the potential of the combination FIB–NIL in advanced photonic applications.