Voltage-Induced Degradation for Enhanced Purity and Reproducibility of Quantum Emission in Monolayer 2D Materials
We report a voltage-induced degradation technique using conductive atomic force microscopy to enhance the single-photon purity and reproducibility of quantum emitters in monolayer tungsten diselenide (WSe<sub>2</sub>). By applying a controlled electric field across a monolayer WSe<sub>2</sub>/poly(vinylidene fluoride-<i>co</i>-trifluoroethylene) (P(VDF-TrFE)) on a silicon substrate, localized degradation is induced around nanoindented emitter sites in the WSe<sub>2</sub>. This process selectively suppresses defect-bound exciton emissions while preserving emission from pristine regions within the indentations. Photoluminescence and second-order correlation measurements at 18 K demonstrate a substantial increase in single-photon purity when comparing emitters from untreated and voltage-treated regions. Emitters from untreated regions showed average values of <i>g</i><sup>2</sup>(0) near or above the 0.5 threshold. In contrast, emitters from voltage-treated regions exhibited <i>g</i><sup>2</sup>(0) values consistently below 0.14, with most falling near 0.05, demonstrating high-purity single-photon emission well below the <i>g</i><sup>2</sup>(0) < 0.5 threshold. Importantly, the voltage-induced degradation method significantly boosts the production yield of high-purity single-photon emitters with <i>g</i><sup>2</sup>(0) < 0.2 in over 10% of treated sites─an order of magnitude improvement over typical yield in two-dimensional (2D) materials. This nonvolatile, spatially selective approach enhances both emitter purity and yield without compromising emission intensity, offering a scalable and reliable route for integrating high-quality quantum emitters into photonic platforms. Integration with spectral tuning strategies such as strain engineering, local dielectric patterning, or electrostatic gating could further enable deterministic, wavelength-selective single-photon sources for advanced quantum photonic applications.
Authors
- Hsun‐Jen Chuang (ORCID: https://orcid.org/0000-0003-0437-8388)
- Mehmet A. Noyan (ORCID: https://orcid.org/0000-0002-9129-6104)
- Kathleen M. McCreary (ORCID: https://orcid.org/0000-0003-2737-585X)
- Berend T. Jonker (ORCID: https://orcid.org/0000-0001-8816-7857)
- Sung‐Joon Lee
Institutions
- United States Naval Research Laboratory (US)
- United States Navy (US)
Publication Details
- Journal
- ACS Nano
- Published
- 2025-09-16
- DOI
- https://doi.org/10.1021/acsnano.5c09799
- Citations
- 1
- Primary Topic
- Graphene research and applications
- Type
- article
- Field-Weighted Citation Impact
- 0.52