Nonlocal Signatures of Spin Interference and Incipient Edge-State Formation in Graphene-on-Chromia Heterostructures

We provide evidence of incipient edge-state formation in graphene-on-chromia heterostructures, resulting from the presence of substrate-induced spin-orbit coupling (SOC). Low-temperature spin-Hall measurements of the graphene exhibit large fluctuations of the nonlocal resistance (<i>R</i><sub>nl</sub>) as the Fermi level is swept through its bands. These features persist to much higher temperatures (>60 K) than is typical for mesoscopic effects in normal metals and semiconductors, suggesting that they are associated with a very different mechanism to normal charge-based transport. The fluctuations of the nonlocal resistance are moreover invariant to the application of large magnetic fields (as high as 7 T), a characteristic that speaks to a significant edge-like component to transport. To provide insight into these results, we have formulated a (Landauer-Büttiker) model of quantum transport in graphene in the presence of strong SOC. Our calculations capture the key features of experiments, connecting the large quantum fluctuations in <i>R</i><sub>nl</sub> to the impact of the substrate-induced SOC. More specifically, the spin-orbit interaction is found to imbue the spin diffusion with an edge-like character, displacing injected spins toward the edges of the graphene channel while retaining a coupling to disorder within its interior. It is this interplay of edge-like conduction, with more conventional transport within the interior of the two-dimensional channel, which gives rise to the observed fluctuations in <i>R</i><sub>nl</sub> as the Fermi level is varied.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2025-09-15
DOI
https://doi.org/10.1021/acsami.5c10324
Primary Topic
Graphene research and applications
Type
article
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article

Nonlocal Signatures of Spin Interference and Incipient Edge-State Formation in Graphene-on-Chromia Heterostructures

Hamed Vakili, Bilal Barut, Shenchu Yin, P. A. Dowben et al.
ACS Applied Materials & Interfaces
Graphene research and applications
article

Nonlocal Signatures of Spin Interference and Incipient Edge-State Formation in Graphene-on-Chromia Heterostructures

Hamed Vakili, Bilal Barut, Shenchu Yin, P. A. Dowben, F. Bird, Nargess Arabchigavkani, Jubin Nathawat, Ripudaman Dixit, Ather Mahmood, A. A. Kovalev, Christian Binek, Keke He, Michael D. Randle
article en

Abstract

We provide evidence of incipient edge-state formation in graphene-on-chromia heterostructures, resulting from the presence of substrate-induced spin-orbit coupling (SOC). Low-temperature spin-Hall measurements of the graphene exhibit large fluctuations of the nonlocal resistance (<i>R</i><sub>nl</sub>) as the Fermi level is swept through its bands. These features persist to much higher temperatures (>60 K) than is typical for mesoscopic effects in normal metals and semiconductors, suggesting that they are associated with a very different mechanism to normal charge-based transport. The fluctuations of the nonlocal resistance are moreover invariant to the application of large magnetic fields (as high as 7 T), a characteristic that speaks to a significant edge-like component to transport. To provide insight into these results, we have formulated a (Landauer-Büttiker) model of quantum transport in graphene in the presence of strong SOC. Our calculations capture the key features of experiments, connecting the large quantum fluctuations in <i>R</i><sub>nl</sub> to the impact of the substrate-induced SOC. More specifically, the spin-orbit interaction is found to imbue the spin diffusion with an edge-like character, displacing injected spins toward the edges of the graphene channel while retaining a coupling to disorder within its interior. It is this interplay of edge-like conduction, with more conventional transport within the interior of the two-dimensional channel, which gives rise to the observed fluctuations in <i>R</i><sub>nl</sub> as the Fermi level is varied.

ACS Applied Materials & InterfacesVol. 17(38)
University of Nebraska–Lincoln (US), Chinese Academy of Sciences (CN), Chr. Hansen (Denmark) (DK), Institute of Microelectronics (SG), Institute of Microelectronics (CN), Fraunhofer Institute for Integrated Circuits (DE), University at Buffalo, State University of New York (US)
Openalex Percentile: Top 81%
Graphene research and applications
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