High Quality Factor, High Sensitivity Ta <sub>2</sub> O <sub>5</sub> Microring Resonator for Biochemical Sensing
We demonstrate a high-performance Ta.O. microring resonator fabricated using electron-beam lithography and inductively coupled plasma etching. The loaded Q-factor of the fundamental TE mode reaches 3.1 × 10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sup> at 1550 nm under ambient conditions, with post-annealing at 600 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$^{\circ }$</tex-math></inline-formula>C further elevating this value to 5.2 × 10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sup>. The waveguide propagation losses in the telecom band is also reduced from 1.3 dB/cm to 0.6 dB/cm with post annealing. For practical validation of sensing capabilities, the device was implemented in sodium chloride concentration detection, achieving a sensitivity of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex-math notation="LaTeX">$\sim$</tex-math></inline-formula>279 nm/RIU and an intrinsic limit of detection (iLOD) of 1.78 × 10<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-5</sup>. RIU. This represents the first reported instance of such performance metrics in on-chip Ta<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sub> microring-based sensors. The synergistic combination of exceptional Q-factor, minimized optical loss, and enhanced detection sensitivity establishes this platform as a compelling candidate for next-generation integrated photonic sensing systems.
Authors
- Bin Fang (ORCID: https://orcid.org/0000-0003-0674-1136)
- Rongping Wang (ORCID: https://orcid.org/0000-0002-4426-824X)
- Jiaqi Yang (ORCID: https://orcid.org/0000-0001-8197-4971)
- Zhe Long
- Zhongming Zeng (ORCID: https://orcid.org/0000-0001-7240-2058)
- Yi Zou (ORCID: https://orcid.org/0000-0002-7675-8542)
- Qi Cheng (ORCID: https://orcid.org/0009-0004-6563-2719)
- Yu Lin (ORCID: https://orcid.org/0000-0003-0006-164X)
- Peng Chen (ORCID: https://orcid.org/0009-0005-7563-7334)
- Zhiping Zhou
- Zheng Zhang (ORCID: https://orcid.org/0009-0006-9558-6535)
- Zhen Yang (ORCID: https://orcid.org/0000-0002-6058-0217)
Institutions
- Ningbo University (CN)
- Chinese Academy of Sciences (CN)
- Peking University (CN)
- ShanghaiTech University (CN)
- Suzhou Institute of Nano-tech and Nano-bionics (CN)
Publication Details
- Journal
- Journal of Lightwave Technology
- Published
- 2025-09-16
- DOI
- https://doi.org/10.1109/jlt.2025.3610209
- Primary Topic
- Advanced MEMS and NEMS Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00