In situ synthesis of Te/Si heterojunction photodetectors enabling ultra-broadband UV-vis-IR photoelectric conversion

Over the past decade, 2D elemental semiconductors have risen to prominence within the 2D material family, thanks to their simple crystal structures and compositions coupled with a wealth of physical properties. Among these, 2D tellurium (Te) stands out as a highly promising candidate for ultra-broadband photoelectric technologies, owing to its relatively small bandgap, exceptional carrier mobility, high air-stability, and strong light interactions. In this study, high-quality centimeter-scale Te nanofilms have been successfully produced by exploiting pulsed-laser deposition (PLD). By performing the deposition on pre-patterned SiO2/Si substrates, Te/Si 2D/3D heterojunction array is in-situ formed. Inspiringly, taking advantages of the relatively small bandgap of Te, the Te/Si photodetectors demonstrate ultra-broadband photoresponse from ultraviolet to near-infrared (370.6 nm to 2240 nm), enabling them to serve as important complements to conventional 2D materials such as MoS2. In addition, an outstanding on/off ratio of ~108 and a fast response rate (a response/recovery time of 3.7 ms/4.4 ms) are achieved, which is associated with the large band offset and strong interfacial built-in electric field that contributes to suppressing the dark current and separating photocarriers. Beyond these, a 35×35 matrix array has been successfully constructed, where the devices exhibit comparable properties, with a production yield of 100% for the random 100 tested devices. The average responsivity, external quantum efficiency and detectivity reach 249 A/W, 76350% and 1.15 1011 Jones, respectively, making the Te/Si devices among the best-performing 2D/3D heterojunction photodetectors. On the whole, this study have established that PLD is a promising technique for producing high-quality Te nanofilms in a well scalable manner, and Te/Si 2D/3D heterojunction provides a promising platform for implementing high-performance ultra-broadband photoelectronic technologies.

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Published
2025-09-15
DOI
https://doi.org/10.1117/12.3070742
Primary Topic
Photonic and Optical Devices
Type
article
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article

In situ synthesis of Te/Si heterojunction photodetectors enabling ultra-broadband UV-vis-IR photoelectric conversion

Jianting Lu, Honghui Liu, Yuebo Liu
Photonic and Optical Devices
article

In situ synthesis of Te/Si heterojunction photodetectors enabling ultra-broadband UV-vis-IR photoelectric conversion

Jianting Lu, Honghui Liu, Yuebo Liu
article en

Abstract

Over the past decade, 2D elemental semiconductors have risen to prominence within the 2D material family, thanks to their simple crystal structures and compositions coupled with a wealth of physical properties. Among these, 2D tellurium (Te) stands out as a highly promising candidate for ultra-broadband photoelectric technologies, owing to its relatively small bandgap, exceptional carrier mobility, high air-stability, and strong light interactions. In this study, high-quality centimeter-scale Te nanofilms have been successfully produced by exploiting pulsed-laser deposition (PLD). By performing the deposition on pre-patterned SiO2/Si substrates, Te/Si 2D/3D heterojunction array is in-situ formed. Inspiringly, taking advantages of the relatively small bandgap of Te, the Te/Si photodetectors demonstrate ultra-broadband photoresponse from ultraviolet to near-infrared (370.6 nm to 2240 nm), enabling them to serve as important complements to conventional 2D materials such as MoS2. In addition, an outstanding on/off ratio of ~108 and a fast response rate (a response/recovery time of 3.7 ms/4.4 ms) are achieved, which is associated with the large band offset and strong interfacial built-in electric field that contributes to suppressing the dark current and separating photocarriers. Beyond these, a 35×35 matrix array has been successfully constructed, where the devices exhibit comparable properties, with a production yield of 100% for the random 100 tested devices. The average responsivity, external quantum efficiency and detectivity reach 249 A/W, 76350% and 1.15 1011 Jones, respectively, making the Te/Si devices among the best-performing 2D/3D heterojunction photodetectors. On the whole, this study have established that PLD is a promising technique for producing high-quality Te nanofilms in a well scalable manner, and Te/Si 2D/3D heterojunction provides a promising platform for implementing high-performance ultra-broadband photoelectronic technologies.

China Electronic Product Reliability and Environmental Test Institute (CN)
Openalex Percentile: Top 76%
Photonic and Optical Devices
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