Monolithic interferometric modules for multi-axis coordinate positioning with sub-nanometre precision

We report on developing, characterizing, and verifying a compact, monolithic laser interferometric assembly designed for high-precision two- and three-axis displacement measurements in coordinate positioning systems. The design targets OEM integration into advanced precision motion platforms, including nanometrology instruments, semiconductor manufacturing equipment, and ultra-high vacuum (UHV) environments. Using a single laser source, the assembly integrates multiple interferometers into a monolithic L-shaped base frame, enabling sub-nanometer periodic error in X-Y motion systems while minimizing geometric and thermal instabilities. The pre-aligned and pre-adjusted architecture simplifies integration, enhances long-term stability, and ensures consistent metrological performance. The system’s verification protocol employs quadrature phase analysis and systematic error metrics to characterize performance and optimise assembly. The results indicate sub-nanometer measurement capability and suggest the system’s suitability for scalable implementation in advanced coordinate metrology applications.

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Published
2025-09-09
DOI
https://doi.org/10.1117/12.3073019
Primary Topic
Advanced Measurement and Metrology Techniques
Type
article
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article

Monolithic interferometric modules for multi-axis coordinate positioning with sub-nanometre precision

Ondřej Čı́p, Josef Lazar, Šimon Řeřucha, Břetislav Mikel et al.
Advanced Measurement and Metrology Techniques
article

Monolithic interferometric modules for multi-axis coordinate positioning with sub-nanometre precision

Ondřej Čı́p, Josef Lazar, Šimon Řeřucha, Břetislav Mikel, Miroslava Holá
article en

Abstract

We report on developing, characterizing, and verifying a compact, monolithic laser interferometric assembly designed for high-precision two- and three-axis displacement measurements in coordinate positioning systems. The design targets OEM integration into advanced precision motion platforms, including nanometrology instruments, semiconductor manufacturing equipment, and ultra-high vacuum (UHV) environments. Using a single laser source, the assembly integrates multiple interferometers into a monolithic L-shaped base frame, enabling sub-nanometer periodic error in X-Y motion systems while minimizing geometric and thermal instabilities. The pre-aligned and pre-adjusted architecture simplifies integration, enhances long-term stability, and ensures consistent metrological performance. The system’s verification protocol employs quadrature phase analysis and systematic error metrics to characterize performance and optimise assembly. The results indicate sub-nanometer measurement capability and suggest the system’s suitability for scalable implementation in advanced coordinate metrology applications.

Czech Academy of Sciences, Institute of Scientific Instruments (CZ)
Openalex Percentile: Top 75%
Advanced Measurement and Metrology Techniques
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Monolithic interferometric modules for multi-axis coordinate positioning with sub-nanometre precision — Ondřej Čı́p, Josef Lazar, et al. · (2025) | TGRS Research Map | TGRS