Thickness Influences on Structural and Optical Properties of Thermally Annealed (GaIn)2O3 Films
This work explores the relationship between the thickness and the structural, morphological, and optical features of thermally annealed (GaIn)<sub>2</sub>O<sub>3</sub> thin films grown by pulsed laser deposition at room temperature. The thickness of the (GaIn)<sub>2</sub>O<sub>3</sub> films varied from 20 to 391 nm with an increase in deposition time. The film with a thickness of about 105 nm showed largest grain size as well as the strongest XRD peak intensity, as measured by atomic force microscopy and X-ray diffraction. The studies on the optical properties show that the bandgap value decreased from 5.14 to 4.55 eV with the change in the film thickness from 20 to 391 nm. The film thickness had a significant impact on the structure, morphology, and optical properties of (GaIn)<sub>2</sub>O<sub>3</sub>, and the PLD growth mode notably influenced the film quality. The results suggest that optimizing the film thickness is essential for improving the film quality and achieving the target bandgap.
Authors
- Xingpeng Liu (ORCID: https://orcid.org/0000-0003-4177-0389)
- Shiyang Zhang (ORCID: https://orcid.org/0000-0001-6229-3652)
- Fabi Zhang (ORCID: https://orcid.org/0000-0002-4896-6854)
- Zan Hui Chen (ORCID: https://orcid.org/0000-0001-9195-4157)
- Shifeng Xie (ORCID: https://orcid.org/0009-0002-6843-7391)
- Tangyou Sun (ORCID: https://orcid.org/0000-0002-9971-3793)
- Ying Li (ORCID: https://orcid.org/0000-0003-4941-571X)
- Haiou Li (ORCID: https://orcid.org/0000-0001-8528-0635)
- Wensheng Yang
Institutions
- China Electronics Technology Group Corporation (CN)
- Guilin University of Electronic Technology (CN)
Publication Details
- Journal
- Nanomaterials
- Published
- 2025-09-09
- DOI
- https://doi.org/10.3390/nano15181385
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China
- Division of Graduate Education