Atomic Layer Deposition and Electron Beam Lithography for Nanostructured Films in Meta-Optics and Surface Engineering
This work explores atomic layer deposition and electron beam lithography for fabricating nanostructured films that enhance meta-optics and surface engineering. By tailoring nanoantenna geometries and optimizing light confinement in metasurfaces, we enable advanced optical functionalities with efficient control over resonances, propagation characteristics, and material responses.
Authors
- Viktoriia E. Babicheva (ORCID: https://orcid.org/0000-0002-0789-5738)
- Li Liu (ORCID: https://orcid.org/0000-0001-8512-8676)
- Chun‐Chieh Chang (ORCID: https://orcid.org/0009-0005-9109-4034)
- Evan Modak Arup (ORCID: https://orcid.org/0009-0002-5568-0798)
Institutions
- Los Alamos National Laboratory (US)
- University of New Mexico (US)
- Center for Integrated Nanotechnologies (US)
Publication Details
- Published
- 2025-08-13
- DOI
- https://doi.org/10.1109/rapid64712.2025.11151365
- Primary Topic
- Optical Coatings and Gratings
- Type
- article
- Field-Weighted Citation Impact
- 0.00