Simulation-Based Optimization of Very Low Radio Frequency Plasma in Intensifying Reactive Species for Graphene Production

Graphene production has advanced; however, achieving high-purity, energy-efficient synthesis remains difficult. Conventional thermal deposition methods like Chemical Vapor Deposition (CVD) and modern techniques like microwave plasma, either suffered due to high operational cost, inconsistent quality, require high energy, or scalability limitations. This research considers the use of low-frequency radio frequency (RF) plasma in inductively coupled plasma (ICP) for the optimization of reactive species generation from methane. Through simulation modelling with COMSOL Multiphysics, voltage, frequency, and flow rate effects on electron density, electron temperature, and reactive species production were assessed. Results show that the 30 kV, 100 kHz, and 80 L/min plasma jet had the highest electron density and uniformity of reactive species. The findings provide the basis for scalable, efficient, and high-purity graphene synthesis based on very low-frequency (VLF) RF plasma and provide a potential alternative to the RF Plasma that normally operates at high frequency in megahertz.