Exploration of Digital Art Pattern Design Based on Ant Colony Optimization

The domain of digital art pattern design represents a multifaceted domain incorporating aesthetics, symmetry, and creativity, while the usage of optimization algorithms is also highly valuable in digital art pattern design. This research intends to investigate the optimization algorithm for digital art pattern design that is based on Ant Colony Optimization, as it pertains to design works' symmetry and aesthetics. A progression of experiments were performed to study and compare Ant Colony Optimization and Simulated Annealing as an optimization approach that leads to better digital art pattern design. Ant colony optimization and simulated annealing are two different optimization methods used to optimize symmetry and aesthetics in all directions, and the results of each optimization method can be captured and analyzed. The experimental results of the studies exhibit that the symmetry ACO ranged from 5.8 to 9.4 compared to symmetry SA ranged from 4.3 to 8.1 for the symmetry. The ACO based optimization for digital art pattern design is superior to the SA in terms of aesthetics and symmetry. When considering aesthetics, the ACO is a better representation for high aesthetics with symmetrical results than the <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$S A$</tex>.