Polarization aberration Mueller matrix calculus and optimization theory for the plane symmetric optical system

Plane-symmetric reflective optical systems are commonly used for polarization remote sensing imaging due to their high resolution and contrast characteristics. One critical aspect that affects image contrast and resolution is the polarization aberrations that arise from the reflective surfaces. In previous research, we proposed a simplified polarization aberration calculus based on the Jones matrix. Now, we verify the feasibility of the simplified calculus through experiments. In addition, the previous Jones matrix calculus is extended to the Mueller matrix, which expands the applicability of this simplified calculus. Furthermore, we explore how the polarization aberrations affect the physical characteristics of the Mueller point spread matrix (MPSM). Finally, we establish a new merit function that can optimize the MPSM and wavefront at the same time, and the optimization result shows that the optimized optical system is closer to the polarization aberrations-free state. The wavefront quality still maintains good performance. This method is suitable for all the plane-symmetric optical systems requiring low polarization aberrations.

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Publication Details

Journal
Optical Engineering
Published
2025-09-04
DOI
https://doi.org/10.1117/1.oe.64.9.095101
Primary Topic
Optical Polarization and Ellipsometry
Type
article
Field-Weighted Citation Impact
0.00

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Polarization aberration Mueller matrix calculus and optimization theory for the plane symmetric optical system

Kaikai Wang, Haodong Shi, Chao Dong, Chao Wang et al.
Optical Engineering
Optical Polarization and Ellipsometry
article

Polarization aberration Mueller matrix calculus and optimization theory for the plane symmetric optical system

Kaikai Wang, Haodong Shi, Chao Dong, Chao Wang, Jianan Liu, Qi Wang
article en

Abstract

Plane-symmetric reflective optical systems are commonly used for polarization remote sensing imaging due to their high resolution and contrast characteristics. One critical aspect that affects image contrast and resolution is the polarization aberrations that arise from the reflective surfaces. In previous research, we proposed a simplified polarization aberration calculus based on the Jones matrix. Now, we verify the feasibility of the simplified calculus through experiments. In addition, the previous Jones matrix calculus is extended to the Mueller matrix, which expands the applicability of this simplified calculus. Furthermore, we explore how the polarization aberrations affect the physical characteristics of the Mueller point spread matrix (MPSM). Finally, we establish a new merit function that can optimize the MPSM and wavefront at the same time, and the optimization result shows that the optimized optical system is closer to the polarization aberrations-free state. The wavefront quality still maintains good performance. This method is suitable for all the plane-symmetric optical systems requiring low polarization aberrations.

Optical EngineeringVol. 64(09)
Changchun University of Science and Technology (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 78%
Optical Polarization and Ellipsometry
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