Degradation of 2.4-kV Ga₂O₃ Schottky Barrier Diode at High Temperatures Up to 500°C
Ga<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>O<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>3</roman></sub> Schottky barrier diodes (SBDs) featuring a field plate (FP) and a composite SiO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub>/SiN<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>x</roman></sub> dielectric layer beneath the FP were fabricated, achieving a breakdown voltage (BV) of 2.4 kV at room temperature (RT). Electrical performance and degradation were analyzed via <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">I–V</i> and <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">C–V</i> measurements from 25 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">∘</sup>C to 500 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">∘</sup>C, revealing temperature-dependent transport, interface stability, and device stability. Upon returning to RT, the diodes exhibited nearly unchanged forward characteristics, while the BV declined significantly from 2.4 kV to 700 V. This behavior indicates a temperature-induced reduction in the barrier height. The detailed analysis revealed that variable range hopping (VRH) dominated the leakage mechanism at moderate temperatures, while thermal emission (TE) became increasingly significant at temperatures exceeding 400 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">∘</sup>C.
Authors
- Michael A. Scarpulla (ORCID: https://orcid.org/0000-0002-6084-6839)
- Wei Jia (ORCID: https://orcid.org/0000-0001-5096-2273)
- Imteaz Rahaman (ORCID: https://orcid.org/0000-0002-2567-0559)
- Kai Fu (ORCID: https://orcid.org/0000-0002-9405-7512)
- Berardi Sensale‐Rodriguez (ORCID: https://orcid.org/0000-0001-7404-1743)
- Hunter D. Ellis (ORCID: https://orcid.org/0000-0003-0226-5240)
- A. M. Hillas
- Botong Li (ORCID: https://orcid.org/0009-0001-7772-5419)
Institutions
- University of Utah (US)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-09-04
- DOI
- https://doi.org/10.1109/ted.2025.3601139
- Citations
- 2
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.85