Sintering Kinetics, Mechanical Properties, and Electrical Conductivity of Ti-67 at% Al Targets Fabricated via Spark Plasma Sintering

Ti–Al alloys have widespread applications as targets in hard coatings by PVD (Physical Vapor Deposition). While the importance of target density is recognized, the densification mechanisms of Ti-67 at% Al targets, particularly during spark plasma sintering (SPS), remain poorly understood, hindering process optimization. This study aims to clarify these mechanisms by fabricating Ti-67 at% Al targets via SPS and examining their densification behavior through a detailed analysis of the creep model based on the stress exponent (n) and apparent activation energy (Qd). The target’s relative density gradually increased in the temperature range of 370–530 °C, whereas the grain size remained relatively constant, indicating that the densification process dominated during this period. The results reveal that densification is primarily controlled by intergranular diffusion (n ≈ 2, Qd = 97.29 kJ/mol) and dislocation climbing (n ≈ 3, Qd = 158.74 kJ/mol). The target’s relative density reached 98.25% at 530 °C, with a corresponding grain size of 10.86 ± 1.08 μm. Additionally, as the temperature increased, the Vickers hardness of the target increased from 61.56 HV to 129.66 HV, and the electrical conductivity rose from 0.23 S/cm to 0.86 S/cm. This work provides a fundamental understanding of the densification kinetics in Ti-67 at% Al alloys during SPS, establishing a crucial guideline for fabricating high-performance PVD targets.

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Journal
Coatings
Published
2025-09-03
DOI
https://doi.org/10.3390/coatings15091029
Primary Topic
Advanced materials and composites
Type
article
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article

Sintering Kinetics, Mechanical Properties, and Electrical Conductivity of Ti-67 at% Al Targets Fabricated via Spark Plasma Sintering

Yibing Su, Meijun Yang, Qizhong Li, Yuzhe Han et al.
Coatings
Advanced materials and composites
article

Sintering Kinetics, Mechanical Properties, and Electrical Conductivity of Ti-67 at% Al Targets Fabricated via Spark Plasma Sintering

Yibing Su, Meijun Yang, Qizhong Li, Yuzhe Han, Rong Tu, Weiyan Wang, Takashi Goto
article en

Abstract

Ti–Al alloys have widespread applications as targets in hard coatings by PVD (Physical Vapor Deposition). While the importance of target density is recognized, the densification mechanisms of Ti-67 at% Al targets, particularly during spark plasma sintering (SPS), remain poorly understood, hindering process optimization. This study aims to clarify these mechanisms by fabricating Ti-67 at% Al targets via SPS and examining their densification behavior through a detailed analysis of the creep model based on the stress exponent (n) and apparent activation energy (Qd). The target’s relative density gradually increased in the temperature range of 370–530 °C, whereas the grain size remained relatively constant, indicating that the densification process dominated during this period. The results reveal that densification is primarily controlled by intergranular diffusion (n ≈ 2, Qd = 97.29 kJ/mol) and dislocation climbing (n ≈ 3, Qd = 158.74 kJ/mol). The target’s relative density reached 98.25% at 530 °C, with a corresponding grain size of 10.86 ± 1.08 μm. Additionally, as the temperature increased, the Vickers hardness of the target increased from 61.56 HV to 129.66 HV, and the electrical conductivity rose from 0.23 S/cm to 0.86 S/cm. This work provides a fundamental understanding of the densification kinetics in Ti-67 at% Al alloys during SPS, establishing a crucial guideline for fabricating high-performance PVD targets.

CoatingsVol. 15(9)
Wuhan University of Technology (CN), Tohoku University (JP), Chaozhou Central Hospital (CN)
National Natural Science Foundation of China, Higher Education Discipline Innovation Project
Openalex Percentile: Top 76%
Advanced materials and composites
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