Ultra‐High‐Speed Dilute Nitride Photodetectors on GaAs Substrate for 1310 nm Operation (Advanced Optical Materials 25/2025)

Dilute Nitride Photodetectors Dilute nitride photodetectors at 1310 nm wavelength fabricated using standard GaAs technology are reported that operate with low dark current and ultra-high speed, despite their very low carrier mobility compared to those on InP; achieved by embedding confined cloud of electrons, kept in quasi-equilibrium, that landscape the electric field, and respond collectively to the photoelectrons, circumventing transit time limitations. More details can be found in article 10.1002/adom.202500115 by Bahram Nabet and co-workers.

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Publication Details

Journal
Advanced Optical Materials
Published
2025-09-01
DOI
https://doi.org/10.1002/adom.70255
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
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article

Ultra‐High‐Speed Dilute Nitride Photodetectors on GaAs Substrate for 1310 nm Operation (Advanced Optical Materials 25/2025)

Bahram Nabet, F. Quaranta, Marc Currie, A. Cola et al.
Advanced Optical Materials
GaN-based semiconductor devices and materials
article

Ultra‐High‐Speed Dilute Nitride Photodetectors on GaAs Substrate for 1310 nm Operation (Advanced Optical Materials 25/2025)

Bahram Nabet, F. Quaranta, Marc Currie, A. Cola, Michel Francois
article en

Abstract

Dilute Nitride Photodetectors Dilute nitride photodetectors at 1310 nm wavelength fabricated using standard GaAs technology are reported that operate with low dark current and ultra-high speed, despite their very low carrier mobility compared to those on InP; achieved by embedding confined cloud of electrons, kept in quasi-equilibrium, that landscape the electric field, and respond collectively to the photoelectrons, circumventing transit time limitations. More details can be found in article 10.1002/adom.202500115 by Bahram Nabet and co-workers.

Advanced Optical MaterialsVol. 13(25)
United States Naval Research Laboratory (US), Orasure Technologies (United States) (US), Optical Sciences (United States) (US), National Research Council (IT), Institute for Microelectronics and Microsystems (IT), Bethlehem Area School District (US), Drexel University (US)
Openalex Percentile: Top 86%
GaN-based semiconductor devices and materials
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Ultra‐High‐Speed Dilute Nitride Photodetectors on GaAs Substrate for 1310 nm Operation (Advanced Optical Materials 25/2025) — Bahram Nabet, F. Quaranta, et al. · Advanced Optical Materials (2025) | TGRS Research Map | TGRS