Alleviation of self-heating degradation in polycrystalline silicon thin-film transistors via voltage pulse modulation
This work presents a voltage pulse modulation strategy to effectively mitigate self-heating degradation in polycrystalline silicon thin-film transistors. By applying synchronized voltage stress (SVS) with optimized pulse parameters, the proposed method significantly suppresses channel temperature buildup and reduces device degradation. A predictive thermal model, rigorously validated through coupled simulations and experimental measurements, enables precise control of temperature dynamics under diverse operating conditions. Experimental demonstrations using light-emitting diode-integrated driver circuits reveal substantially improved operational stability under SVS, in sharp contrast to the rapid performance degradation observed with continuous stress. This purely electrical approach requires no structural modifications and offers a practical and cost-effective solution to enhance the reliability of advanced display technologies.
Authors
- Man Wong (ORCID: https://orcid.org/0000-0002-2837-6646)
- Hoi Sing Kwok (ORCID: https://orcid.org/0000-0002-2820-9530)
- Meng Zhang (ORCID: https://orcid.org/0000-0002-9302-4057)
- Zhendong Jiang
- Pengfei Liu (ORCID: https://orcid.org/0009-0009-6995-8974)
- Lanrong Zou
- Lei Lü (ORCID: https://orcid.org/0000-0001-5275-2181)
Institutions
- Shenzhen University (CN)
- Hong Kong University of Science and Technology (HK)
- Peking University (CN)
- Integrated Optoelectronics (Norway) (NO)
- Peking University Shenzhen Hospital (CN)
- Shenzhen Technology University (CN)
- University of Hong Kong (HK)
Publication Details
- Journal
- Applied Physics Letters
- Published
- 2025-09-01
- DOI
- https://doi.org/10.1063/5.0274914
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China