Potentiostatic Electrodeposition and Characterizations of Tin Selenide (SnSe) Films on Gold
In this work, we report a study of the potentiostatic electrodeposition on gold of SnSe, where Sn(II) and Se(IV) were used as precursors and sodium oxalate as a complexing agent. In order to investigate the behavior of the electrochemical system on gold, cyclic voltametric (CV) experiments were first carried out. A narrow potential window, between −0.5 and −0.6 V vs Ag/AgCl (KCl sat.) was then defined, as being suitable for thin film deposition. Textured [011] and [111] polycrystalline SnSe films were obtained with a faradaic yield up to 75%. In addition, the unexpected presence of AuSn alloy was identified during the electrodeposition process, depending on the selected growth potential, both by CVs and X-ray Diffraction (XRD) measurements. Finally, the estimation of the fundamental band gap, i.e., the indirect transition from α -E curves of SnSe films of different thicknesses, provides a signature mean value of 0.7 eV.
Authors
- David Lacroix (ORCID: https://orcid.org/0000-0001-6067-8524)
- Nicolas Stein (ORCID: https://orcid.org/0000-0003-3247-0085)
- Alexandre Zimmer (ORCID: https://orcid.org/0000-0003-0717-4153)
- Gilles Pernot (ORCID: https://orcid.org/0000-0002-2549-3599)
- Gwladys Steciuk (ORCID: https://orcid.org/0000-0002-5666-3570)
- Laura Adam (ORCID: https://orcid.org/0000-0001-9688-6325)
- Abdul Fattah Mohd Tahir (ORCID: https://orcid.org/0000-0001-9580-9627)
Publication Details
- Journal
- Journal of The Electrochemical Society
- Published
- 2025-09-01
- DOI
- https://doi.org/10.1149/1945-7111/ae01de
- Citations
- 1
- Primary Topic
- Chalcogenide Semiconductor Thin Films
- Type
- article
- Field-Weighted Citation Impact
- 0.73