Potentiostatic Electrodeposition and Characterizations of Tin Selenide (SnSe) Films on Gold

In this work, we report a study of the potentiostatic electrodeposition on gold of SnSe, where Sn(II) and Se(IV) were used as precursors and sodium oxalate as a complexing agent. In order to investigate the behavior of the electrochemical system on gold, cyclic voltametric (CV) experiments were first carried out. A narrow potential window, between −0.5 and −0.6 V vs Ag/AgCl (KCl sat.) was then defined, as being suitable for thin film deposition. Textured [011] and [111] polycrystalline SnSe films were obtained with a faradaic yield up to 75%. In addition, the unexpected presence of AuSn alloy was identified during the electrodeposition process, depending on the selected growth potential, both by CVs and X-ray Diffraction (XRD) measurements. Finally, the estimation of the fundamental band gap, i.e., the indirect transition from α -E curves of SnSe films of different thicknesses, provides a signature mean value of 0.7 eV.

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Publication Details

Journal
Journal of The Electrochemical Society
Published
2025-09-01
DOI
https://doi.org/10.1149/1945-7111/ae01de
Citations
1
Primary Topic
Chalcogenide Semiconductor Thin Films
Type
article
Field-Weighted Citation Impact
0.73
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article

Potentiostatic Electrodeposition and Characterizations of Tin Selenide (SnSe) Films on Gold

David Lacroix, Nicolas Stein, Alexandre Zimmer, Gilles Pernot et al.
1 citations
Journal of The Electrochemical Society
Chalcogenide Semiconductor Thin Films
0.73
article

Potentiostatic Electrodeposition and Characterizations of Tin Selenide (SnSe) Films on Gold

David Lacroix, Nicolas Stein, Alexandre Zimmer, Gilles Pernot, Gwladys Steciuk, Laura Adam, Abdul Fattah Mohd Tahir
article en
1 citations

Abstract

In this work, we report a study of the potentiostatic electrodeposition on gold of SnSe, where Sn(II) and Se(IV) were used as precursors and sodium oxalate as a complexing agent. In order to investigate the behavior of the electrochemical system on gold, cyclic voltametric (CV) experiments were first carried out. A narrow potential window, between −0.5 and −0.6 V vs Ag/AgCl (KCl sat.) was then defined, as being suitable for thin film deposition. Textured [011] and [111] polycrystalline SnSe films were obtained with a faradaic yield up to 75%. In addition, the unexpected presence of AuSn alloy was identified during the electrodeposition process, depending on the selected growth potential, both by CVs and X-ray Diffraction (XRD) measurements. Finally, the estimation of the fundamental band gap, i.e., the indirect transition from α -E curves of SnSe films of different thicknesses, provides a signature mean value of 0.7 eV.

Journal of The Electrochemical SocietyVol. 172(9)
Openalex Percentile: Top 24%
Chalcogenide Semiconductor Thin Films
0.73
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Potentiostatic Electrodeposition and Characterizations of Tin Selenide (SnSe) Films on Gold — David Lacroix, Nicolas Stein, et al. · Journal of The Electrochemical Society (2025) | TGRS Research Map | TGRS