LLMCov: A Methodology for LLM-Aided DfT Coverage Improvement in Open-Source Designs

Scan insertion is one of the important steps in the development of test infrastructure in modern designs. During the scan insertion step, it is very crucial to resolve all design rule violations as these violations may lead to significant drop in the test coverage. Because of nature of these violations, it becomes a tedious debugging exercise and requires lot of manual expertise. In this work, we propose AI-based solution for seeking solution for these design rule checks. The power of AI-based techniques (such as CNN-based models or LLM-based methods) is getting widely recognized in the area of EDA tools performance enhancement. Therefore, we develop a LLM-aided DRC debugging methodology to aid the scan synthesis tool that in turn assists the ATPG tool to obtain enhanced test coverage values. Experimental results indicate significant improvement in the test coverage with fixes obtained with assistance of LLM.

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Published
2025-07-20
DOI
https://doi.org/10.1109/itcindia66078.2025.11141575
Primary Topic
Advancements in Photolithography Techniques
Type
article
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article

LLMCov: A Methodology for LLM-Aided DfT Coverage Improvement in Open-Source Designs

Masahiro Fujita, Swagnik Roy, Manisha Kumari, Binod Kumar
Advancements in Photolithography Techniques
article

LLMCov: A Methodology for LLM-Aided DfT Coverage Improvement in Open-Source Designs

Masahiro Fujita, Swagnik Roy, Manisha Kumari, Binod Kumar
article en

Abstract

Scan insertion is one of the important steps in the development of test infrastructure in modern designs. During the scan insertion step, it is very crucial to resolve all design rule violations as these violations may lead to significant drop in the test coverage. Because of nature of these violations, it becomes a tedious debugging exercise and requires lot of manual expertise. In this work, we propose AI-based solution for seeking solution for these design rule checks. The power of AI-based techniques (such as CNN-based models or LLM-based methods) is getting widely recognized in the area of EDA tools performance enhancement. Therefore, we develop a LLM-aided DRC debugging methodology to aid the scan synthesis tool that in turn assists the ATPG tool to obtain enhanced test coverage values. Experimental results indicate significant improvement in the test coverage with fixes obtained with assistance of LLM.

Indian Institute of Technology Jodhpur (IN), Tokyo City University (JP)
Openalex Percentile: Top 78%
Advancements in Photolithography Techniques
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LLMCov: A Methodology for LLM-Aided DfT Coverage Improvement in Open-Source Designs — Masahiro Fujita, Swagnik Roy, et al. · (2025) | TGRS Research Map | TGRS