A Self-Powered Wireless Sensing Circuitry for On-Wafer In-Situ EUV Detection

This paper presents a novel on-wafer self-powered wireless sensing module for extreme ultraviolet (EUV) lithography, advancing prior designs through the integration of a Gate Voltage Controlled Oscillator (GVCO) and an optimized ultra-thick metal on-chip antenna (OCA) for enhanced stability and transmission properties. The surface sensing pad captures incident photons, inducing energy via a coupling device to control the GVCO, whose output frequency reflects real-time EUV intensity. The output frequency signal can be wirelessly transmitted to the receiver through an OCA. It enables real-time monitoring of on-wafer EUV exposure parameters in advanced lithography systems without an external power source, thereby facilitating the yield control of advanced CMOS processes.

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Publication Details

Journal
IEEE Transactions on Semiconductor Manufacturing
Published
2025-09-01
DOI
https://doi.org/10.1109/tsm.2025.3604789
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
Type
article
Field-Weighted Citation Impact
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article

A Self-Powered Wireless Sensing Circuitry for On-Wafer In-Situ EUV Detection

Jenny Yi-Chun Liu, Pin‐Jiun Wu, Ya‐Chin King, Wei Chang et al.
IEEE Transactions on Semiconductor Manufacturing
Integrated Circuits and Semiconductor Failure Analysis
article

A Self-Powered Wireless Sensing Circuitry for On-Wafer In-Situ EUV Detection

Jenny Yi-Chun Liu, Pin‐Jiun Wu, Ya‐Chin King, Wei Chang, Burn J. Lin, Jiaw‐Ren Shih, Chrong Jung Lin, K. W. Yeh
article en

Abstract

This paper presents a novel on-wafer self-powered wireless sensing module for extreme ultraviolet (EUV) lithography, advancing prior designs through the integration of a Gate Voltage Controlled Oscillator (GVCO) and an optimized ultra-thick metal on-chip antenna (OCA) for enhanced stability and transmission properties. The surface sensing pad captures incident photons, inducing energy via a coupling device to control the GVCO, whose output frequency reflects real-time EUV intensity. The output frequency signal can be wirelessly transmitted to the receiver through an OCA. It enables real-time monitoring of on-wafer EUV exposure parameters in advanced lithography systems without an external power source, thereby facilitating the yield control of advanced CMOS processes.

IEEE Transactions on Semiconductor ManufacturingVol. 38(4)
National Tsing Hua University (TW), National Synchrotron Radiation Research Center (TW)
Taiwan Semiconductor Manufacturing Company
Openalex Percentile: Top 78%
Integrated Circuits and Semiconductor Failure Analysis
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A Self-Powered Wireless Sensing Circuitry for On-Wafer In-Situ EUV Detection — Jenny Yi-Chun Liu, Pin‐Jiun Wu, et al. · IEEE Transactions on Semiconductor Manufacturing (2025) | TGRS Research Map | TGRS