Ferroelectric Memory Technology for Big Data Applications

Big Data has an insatiable appetite for larger and better-performing memory. While current memory technologies continue to advance, the performance gaps in current memory and storage technology have motivated the exploration of emerging memory technologies capable of providing new functionalities. Ferroelectric memory is one such promising candidate which has recently experienced a revival after the discovery of ferroelectricity in hafnium dioxide (HfO 2 )—the dielectric of choice in advanced CMOS manufacturing. While the commercial viability of ferroelectric memory technology has made significant progress over the past decade, several challenges related to variation and reliability still stand as a barrier to large-scale commercial implementation. Here, we review some of the outstanding challenges of ferroelectric memory technology along with the recent materials and device innovations that are being considered to overcome them. Moreover, we aim to highlight these challenges as materials and device co-design problems that must be addressed through collaborative efforts that straddle the two disciplines. We identify and provide our perspective on some of the key challenges and opportunities for ferroelectric-based microelectronic technology.

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Publication Details

Journal
ACM Transactions on Embedded Computing Systems
Published
2025-08-30
DOI
https://doi.org/10.1145/3764868
Citations
1
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.73

Funders

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article

Ferroelectric Memory Technology for Big Data Applications

Samuel Stevenson, Nikhil Shukla, Kai Ni, Vijaykrishnan Narayanan
1 citations
ACM Transactions on Embedded Computing Systems
Ferroelectric and Negative Capacitance Devices
0.73
article

Ferroelectric Memory Technology for Big Data Applications

Samuel Stevenson, Nikhil Shukla, Kai Ni, Vijaykrishnan Narayanan
article en
1 citations

Abstract

Big Data has an insatiable appetite for larger and better-performing memory. While current memory technologies continue to advance, the performance gaps in current memory and storage technology have motivated the exploration of emerging memory technologies capable of providing new functionalities. Ferroelectric memory is one such promising candidate which has recently experienced a revival after the discovery of ferroelectricity in hafnium dioxide (HfO 2 )—the dielectric of choice in advanced CMOS manufacturing. While the commercial viability of ferroelectric memory technology has made significant progress over the past decade, several challenges related to variation and reliability still stand as a barrier to large-scale commercial implementation. Here, we review some of the outstanding challenges of ferroelectric memory technology along with the recent materials and device innovations that are being considered to overcome them. Moreover, we aim to highlight these challenges as materials and device co-design problems that must be addressed through collaborative efforts that straddle the two disciplines. We identify and provide our perspective on some of the key challenges and opportunities for ferroelectric-based microelectronic technology.

ACM Transactions on Embedded Computing SystemsVol. 24(6)
University of Notre Dame (US), Pennsylvania State University (US), Ecpi University (US), University of Virginia (US)
National Science Foundation
Openalex Percentile: Top 24%
Ferroelectric and Negative Capacitance Devices
0.73
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Ferroelectric Memory Technology for Big Data Applications — Samuel Stevenson, Nikhil Shukla, et al. · ACM Transactions on Embedded Computing Systems (2025) | TGRS Research Map | TGRS