Towards simultaneous double-side Ni/Cu plated contacts on wet etch opened TOPCon solar cells

Ni/Cu metallization of TOPCon as an alternative to screen printed silver has been widely studied with laser contact opening (LCO) and sequential single-sided electroplating on both sides, with good performance results but some thermal-induced damage. Here, an innovative simultaneous double-side electroplating is presented, with wet etch opening of the passivation layers on the TOPCon precursor samples. Etching time longer than expected is needed for both sides, with wettability issues on the front and slower etch rate of the rear SiN<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">X</inf>. Adhesion is not acceptable for the electrodeposited metallization and the uniformity is poor when residual passivation is present, but despite these challenges a maximum V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OC</inf> of 682 mV is obtained. Overall, the simultaneous double-side electroplating of Ni/Cu contacts works and wet etching requires further improvements to provide good conditions that can provide both good IV performance and good metallization.

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Publication Details

Published
2025-06-08
DOI
https://doi.org/10.1109/pvsc59419.2025.11133113
Primary Topic
Silicon and Solar Cell Technologies
Type
article
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article

Towards simultaneous double-side Ni/Cu plated contacts on wet etch opened TOPCon solar cells

Io Mizushima, Rasmus Schmidt Davidsen, Sune Thorsteinsson, Peter Behrensdorff Poulsen et al.
5 links
Silicon and Solar Cell Technologies
article

Towards simultaneous double-side Ni/Cu plated contacts on wet etch opened TOPCon solar cells

Io Mizushima, Rasmus Schmidt Davidsen, Sune Thorsteinsson, Peter Behrensdorff Poulsen, Gisele Alves dos Reis Benatto, T. A. Tang, Carsten Möller, Roberto Boccardi
article en

Abstract

Ni/Cu metallization of TOPCon as an alternative to screen printed silver has been widely studied with laser contact opening (LCO) and sequential single-sided electroplating on both sides, with good performance results but some thermal-induced damage. Here, an innovative simultaneous double-side electroplating is presented, with wet etch opening of the passivation layers on the TOPCon precursor samples. Etching time longer than expected is needed for both sides, with wettability issues on the front and slower etch rate of the rear SiN<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">X</inf>. Adhesion is not acceptable for the electrodeposited metallization and the uniformity is poor when residual passivation is present, but despite these challenges a maximum V<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OC</inf> of 682 mV is obtained. Overall, the simultaneous double-side electroplating of Ni/Cu contacts works and wet etching requires further improvements to provide good conditions that can provide both good IV performance and good metallization.

Roskilde University (DK), Aarhus University (DK), Instituttet for Produktudvikling (Denmark) (DK), Technical University of Denmark (DK)
Affordable and clean energy
Openalex Percentile: Top 78%
Silicon and Solar Cell Technologies
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