Automation Methodology for Complete Electro-Thermal Simulation of a DMOS Chip Model

Recent advancements in power MOSFET technology have brought forth devices characterized by low specific on-resistance, high transconductance and rapid switching speeds. While these attributes facilitate applications with unprecedented power density, they also introduce challenges related to thermal instability. Addressing these challenges necessitates the utilization of electro-thermal simulation techniques, with Finite Element Analysis (FEA) playing a pivotal role. FEA enables precise modelling of temperature distribution and electrical behavior within the device structure. Iterative refinement of material properties ensures convergence, providing valuable insights into thermal-electrical interactions and facilitating design optimization.

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Publication Details

Published
2025-06-18
DOI
https://doi.org/10.1109/eaeeie65428.2025.11136760
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
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article

Automation Methodology for Complete Electro-Thermal Simulation of a DMOS Chip Model

Marius Purcar, Daniel Tscharnuter, Manuel Petersmann, Adrian Bojiță et al.
Silicon Carbide Semiconductor Technologies
article

Automation Methodology for Complete Electro-Thermal Simulation of a DMOS Chip Model

Marius Purcar, Daniel Tscharnuter, Manuel Petersmann, Adrian Bojiță, Luiza Dobre
article en

Abstract

Recent advancements in power MOSFET technology have brought forth devices characterized by low specific on-resistance, high transconductance and rapid switching speeds. While these attributes facilitate applications with unprecedented power density, they also introduce challenges related to thermal instability. Addressing these challenges necessitates the utilization of electro-thermal simulation techniques, with Finite Element Analysis (FEA) playing a pivotal role. FEA enables precise modelling of temperature distribution and electrical behavior within the device structure. Iterative refinement of material properties ensures convergence, providing valuable insights into thermal-electrical interactions and facilitating design optimization.

Technical University of Cluj-Napoca (RO), Österreichisches Forschungsinstitut für Chemie und Technik (AT)
Infineon Technologies
Openalex Percentile: Top 78%
Silicon Carbide Semiconductor Technologies
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