Anomalous Reconfigurable‐Transport in MoS <sub>2</sub> Transistors by Electrically‐Switchable van der Waals Interfacial Dipole

Interfacial charge transfer leads to the formation of an electric dipole at the interface of a van der Waals (vdW) heterostructure. The switching of dipole polarity using an electric field provides an effective method for modulating the electronic properties of vdW systems. However, the experimental observation of switched vdW dipoles is challenging, as it is concealed by the electrostatic gating effect. In this work, the significant electrical tunability of the strong interfacial dipole formed in an insulator-semiconductor heterostructure of high-work-function BiOCl and MoS<sub>2</sub> are demonstrated. The heterostructured device essentially operates as a planar tunneling transistor, where band-to-band tunneling occurs within the vdW doping-defined junction, resulting in a subthreshold swing significantly lower than that of typical field effect transistors. More importantly, the anomalous reconfiguration of electronic transports is observed in MoS<sub>2</sub> transistors due to the switching of vdW dipole and its competition with the electrostatic gating. By varying the BiOCl thickness, the n-type, p-type, anti-ambipolar, and "W"-shaped transfer characteristics are achieved. Furthermore, a dual-gate configuration further enhances functionality of the device, enabling multi-state switching, which is of particularly interest for these applications requiring negative differential resistance. This work offers a scalable, versatile, and non-destructive strategy for tuning reconfigurable two-dimensional transistors.

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Publication Details

Journal
Advanced Materials
Published
2025-08-27
DOI
https://doi.org/10.1002/adma.202502784
Citations
1
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.52

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Anomalous Reconfigurable‐Transport in MoS 2 Transistors by Electrically‐Switchable van der Waals Interfacial Dipole

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article

Anomalous Reconfigurable‐Transport in MoS 2 Transistors by Electrically‐Switchable van der Waals Interfacial Dipole

Yinglun Sun, Shanzheng Du, Yahua Yuan, Huamin Li, Hanbin Chen, Fei Yao, Shengqian Zheng, Jian Sun, Yingchun Cheng, Yaqi Shen, Xiaochi Liu, Yumei Jing
article en
1 citations

Abstract

Interfacial charge transfer leads to the formation of an electric dipole at the interface of a van der Waals (vdW) heterostructure. The switching of dipole polarity using an electric field provides an effective method for modulating the electronic properties of vdW systems. However, the experimental observation of switched vdW dipoles is challenging, as it is concealed by the electrostatic gating effect. In this work, the significant electrical tunability of the strong interfacial dipole formed in an insulator-semiconductor heterostructure of high-work-function BiOCl and MoS<sub>2</sub> are demonstrated. The heterostructured device essentially operates as a planar tunneling transistor, where band-to-band tunneling occurs within the vdW doping-defined junction, resulting in a subthreshold swing significantly lower than that of typical field effect transistors. More importantly, the anomalous reconfiguration of electronic transports is observed in MoS<sub>2</sub> transistors due to the switching of vdW dipole and its competition with the electrostatic gating. By varying the BiOCl thickness, the n-type, p-type, anti-ambipolar, and "W"-shaped transfer characteristics are achieved. Furthermore, a dual-gate configuration further enhances functionality of the device, enabling multi-state switching, which is of particularly interest for these applications requiring negative differential resistance. This work offers a scalable, versatile, and non-destructive strategy for tuning reconfigurable two-dimensional transistors.

Advanced MaterialsVol. 37(45)
Central South University (CN), Yanshan University (CN), University at Buffalo, State University of New York (US)
National Natural Science Foundation of China, Hunan Provincial Science and Technology Department, National Key Research and Development Program of China
Openalex Percentile: Top 34%
2D Materials and Applications
0.52
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