Threshold Voltage Bias Temperature Instability of RF MIS-HEMTs and Schottky HEMTs Under Semi-On State Stress
This study comprehensively investigates the threshold voltage (<italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>th</roman></sub><roman xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">)</roman> instability of AlGaN/GaN MIS-HEMTs under semi-bioscon state conditions. The effects of various temperatures and drain biases are studied. Under semi-bioscon bias conditions, a significant negative <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>th</roman></sub> shift up to -1.0 V is observed in MIS-HEMTs with 10-nm in-situ SiN gate dielectrics, whereas Schottky HEMTs exhibit a negligible <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>th</roman></sub> shift. A gate current analysis, comparing the MIS-HEMT with the source grounded versus floating, suggests that hot electrons induce generation of holes under the semi-on state. TCAD simulations corroborate that the high electric field across the channel of the MIS-HEMT induce hot electrons and hole generation under the semi-bioscon state; dynamic interaction of hot electrons and holes with the gate SiN/AlGaN interfacial states leads to bias temperature instability (BTI) of the <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>th</roman></sub> of the MIS-HEMT. These findings suggest that optimizing the gate dielectric and its interface with the top barrier is crucial to improve the semi-bioscon state stability of radio-frequency (RF) MIS-HEMTs.
Authors
- Tian‐Li Wu (ORCID: https://orcid.org/0000-0001-6788-5470)
- Sachin Yadav (ORCID: https://orcid.org/0000-0003-4530-2603)
- A. Alian (ORCID: https://orcid.org/0000-0003-3463-416X)
- Nadine Collaert (ORCID: https://orcid.org/0000-0002-8062-3165)
- Meng‐Che Tsai (ORCID: https://orcid.org/0000-0002-1301-866X)
- Jingtian Fang (ORCID: https://orcid.org/0000-0002-9493-2276)
- Uthayasankaran Peralagu (ORCID: https://orcid.org/0000-0001-9166-4408)
- Amratansh Gupta (ORCID: https://orcid.org/0000-0003-4313-3463)
- Hao Yu (ORCID: https://orcid.org/0000-0002-1976-0259)
- Barry O’Sullivan (ORCID: https://orcid.org/0000-0002-9036-8241)
- Bertrand Parvais (ORCID: https://orcid.org/0000-0003-0769-7069)
- Aarti Rathi (ORCID: https://orcid.org/0000-0002-3858-1723)
- Nelson de Almeida Braga
- Yi Yang (ORCID: https://orcid.org/0000-0003-0693-9193)
- Wei-Tung Lin
- Tzu-Heng Lin
- Y.-H. Kuo (ORCID: https://orcid.org/0009-0006-5665-104X)
- Anna Navolotskaia
Institutions
- National Yang Ming Chiao Tung University (TW)
- Synopsys (United States) (US)
- IMEC (BE)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-08-28
- DOI
- https://doi.org/10.1109/ted.2025.3600561
- Citations
- 1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.73