Mixed wave mode: Direct evidence of phase transition during uphill-diffusion-based regular pattern formation

The formation of uphill-diffusion-based regular patterns in thin films of solutions was reported two years ago, which was explained as phase transition under non-equilibrium conditions in spinodal decomposition systems. However, definitive evidence is still required to confirm further that the regular patterns are produced via phase transition indeed rather than anisotropic spinodal decomposition. In this work, we observed that an ordered harmonic chemical wave and random spinodal wave can be simultaneously formed in polymer semiconductor solution. Such a mixed wave mode offers clear evidence that the ordered patterns originated from phase transition at non-equilibrium conditions.

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Publication Details

Journal
Applied Physics Letters
Published
2025-08-25
DOI
https://doi.org/10.1063/5.0280331
Citations
1
Primary Topic
Nonlinear Dynamics and Pattern Formation
Type
article
Field-Weighted Citation Impact
1.49

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article

Mixed wave mode: Direct evidence of phase transition during uphill-diffusion-based regular pattern formation

Peng You, Chen Xie, Haoxuan Zeng, Qing Yan et al.
1 citations
Applied Physics Letters
Nonlinear Dynamics and Pattern Formation
1.49
article

Mixed wave mode: Direct evidence of phase transition during uphill-diffusion-based regular pattern formation

Peng You, Chen Xie, Haoxuan Zeng, Qing Yan, Zezhong Xiang, Qing Bai, Tong Shan, Shunpu Li, Jin Li, Yufei Wang, Guangye Zhang
article en
1 citations

Abstract

The formation of uphill-diffusion-based regular patterns in thin films of solutions was reported two years ago, which was explained as phase transition under non-equilibrium conditions in spinodal decomposition systems. However, definitive evidence is still required to confirm further that the regular patterns are produced via phase transition indeed rather than anisotropic spinodal decomposition. In this work, we observed that an ordered harmonic chemical wave and random spinodal wave can be simultaneously formed in polymer semiconductor solution. Such a mixed wave mode offers clear evidence that the ordered patterns originated from phase transition at non-equilibrium conditions.

Applied Physics LettersVol. 127(8)
Shenzhen Technology University (CN), Beihang University (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 14%
Nonlinear Dynamics and Pattern Formation
1.49
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Mixed wave mode: Direct evidence of phase transition during uphill-diffusion-based regular pattern formation — Peng You, Chen Xie, et al. · Applied Physics Letters (2025) | TGRS Research Map | TGRS