Thin-film vertical monolithic III-nitride optoelectronic system
III-nitride multi-quantum well (MQW) diodes are multifunctional devices and exhibit intriguing spectral overlap between emission and responsivity spectra. By reducing device thickness, thin-film vertical (TFV) MQW diodes not only inhibit confined optical waveguide modes but also achieve mode-matching light emission or detection naturally. Here, we monolithically integrated TFV MQW diodes on a III-nitride-on-silicon platform that separately serve as a light-emitting diode and a photodiode. The experimental results confirm that TFV devices reduce the number of confined waveguide modes and eliminate transverse light crosstalk, which leads to a significant reduction in the background photocurrent level at 10−9 A. The monolithic III-nitride optoelectronic systems demonstrate the great potential for full-duplex visible light communication and proximity sensing.
Authors
- Jiabin Yan (ORCID: https://orcid.org/0000-0003-2460-5832)
- Jiawei Shi
- Jiaqi Yin
- Fan Shi (ORCID: https://orcid.org/0000-0002-0717-2441)
- Yongjin Wang (ORCID: https://orcid.org/0000-0001-8109-4640)
- Hongbo Zhu (ORCID: https://orcid.org/0000-0002-1032-4434)
- Mingyuan Xie (ORCID: https://orcid.org/0000-0002-7786-3520)
- Chengxiang Jiang
Institutions
- Nanjing University of Posts and Telecommunications (CN)
Publication Details
- Journal
- Applied Physics Letters
- Published
- 2025-08-25
- DOI
- https://doi.org/10.1063/5.0274673
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Higher Education Discipline Innovation Project
- Basic Research Program of Jiangsu Province
- National Key Research and Development Program of China