Correlation between variable-range hopping conduction and lattice strain in heavily Al-doped 4H-SiC epilayers
Abstract The correlation between variable-range hopping conduction and key material parameters is investigated, including the Al concentration ( C Al ), the full width at half maximum (FWHM) of the X-ray diffraction peak, and the lattice strain in heavily Al-doped 4H-SiC epilayers with C Al exceeding 10 20 cm −3 . The characteristic temperature T 0 derived from the gradient of Mott plots (i.e. <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mi>ln</mml:mi> <mml:mi>ρ</mml:mi> <mml:mo stretchy="false">(</mml:mo> <mml:mi>T</mml:mi> <mml:mo stretchy="false">)</mml:mo> </mml:math> versus T −1/4 ) of the temperature-dependent resistivity ρ ( T ) decreases with increasing C Al . Meanwhile, the FWHM correlates positively with C Al . Because the density of localized states at the Fermi level, g ( E F ( T )), is inversely proportional to T 0 , g ( E F ( T )) increases as a power function of C Al . It also increases with the lattice strain.
Authors
- Hideharu Matsuura (ORCID: https://orcid.org/0000-0001-7190-286X)
- Tomohisa Kato (ORCID: https://orcid.org/0000-0002-9422-6670)
- Kazuma Eto (ORCID: https://orcid.org/0000-0002-5312-4993)
- Shiyang Ji (ORCID: https://orcid.org/0000-0001-6531-7891)
- Atsuki Hidaka (ORCID: https://orcid.org/0009-0001-1266-167X)
- Kazutoshi Kojima (ORCID: https://orcid.org/0000-0002-6797-0461)
- Yuki Kondo (ORCID: https://orcid.org/0000-0002-5263-8722)
- Sadafumi Yoshida
Publication Details
- Journal
- Japanese Journal of Applied Physics
- Published
- 2025-08-22
- DOI
- https://doi.org/10.35848/1347-4065/adfead
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Japan Society for the Promotion of Science