Laser Pulse Shaping Capability at 2050 nm for Dielectric Laser Acceleration
Dielectric laser accelerators (DLAs) have demonstrated higher acceleration gradients compared to traditional RF-based systems, reaching up to GV/m [1]. By precisely controlling the spatio-temporal properties of the driving laser via dispersion management, the synchronous interaction between the charged particle beam and laser can be enhanced, leading to higher electron energy gain [2], [3]. In this contribution, we demonstrate the capability of pulse shaping in our 2050 nm Ho:YLF laser system employing a DAZZLER for DLA applications.
Authors
- Ingmar Hartl (ORCID: https://orcid.org/0000-0001-7274-754X)
- Luca Genovese (ORCID: https://orcid.org/0000-0002-2549-1008)
- Christoph Mahnke (ORCID: https://orcid.org/0000-0003-2606-1680)
- Hüseyin Çankaya (ORCID: https://orcid.org/0000-0001-7262-8831)
- Franz X. Käertner (ORCID: https://orcid.org/0000-0001-8829-5461)
- Sarper Salman (ORCID: https://orcid.org/0000-0002-5764-1955)
Institutions
- Universität Hamburg (DE)
- Deutsches Elektronen-Synchrotron DESY (DE)
- Center for Free-Electron Laser Science (DE)
Publication Details
- Published
- 2025-06-23
- DOI
- https://doi.org/10.1109/cleo/europe-eqec65582.2025.11110675
- Primary Topic
- Laser Material Processing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00