Perfectly Vertical Coupling with High-Efficiency Bi-Layer Grating Coupler for Thin Film SiN Technology
Thin-film Silicon Nitride (TFSiN) platforms are gaining increasing interest in the integrated optics community due to their broad transparency range and low propagation loss [1]. However, the limited thickness of the waveguides (typically from 40 nm to 200 nm) poses a number of challenges, especially when it comes to light coupling between on-chip structures and optical fibers. Indeed, the low index contrast between the TFSiN waveguides and the surrounding silicon dioxide makes the design of efficient grating couplers (GCs) challenging.
Authors
- Cosimo Lacava (ORCID: https://orcid.org/0000-0002-9950-8642)
- Ilaria Cristiani (ORCID: https://orcid.org/0000-0002-6344-4894)
- Frédéric Y. Gardes (ORCID: https://orcid.org/0000-0003-1400-3272)
- Valerio Vitali (ORCID: https://orcid.org/0000-0003-0965-7503)
- Thalía Domínguez Bucio (ORCID: https://orcid.org/0000-0002-3664-1403)
- F. Croce (ORCID: https://orcid.org/0000-0001-9562-2694)
- Periklis Petropoulos (ORCID: https://orcid.org/0000-0002-1576-8034)
- Hao Liu (ORCID: https://orcid.org/0000-0003-2988-9141)
- Anna Pennoni
Institutions
- University of Pavia (IT)
- University of Southampton (GB)
Publication Details
- Published
- 2025-06-23
- DOI
- https://doi.org/10.1109/cleo/europe-eqec65582.2025.11110562
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00