Development of Pulse-Shape-Controlled Hybrid ArF Excimer Laser

Deep ultraviolet (DUV) lasers are actively used for micromachining and semiconductor lithography. Using all-solid-state DUV light source as a seed laser and amplifying by ArF excimer (hybrid laser), high average power as well as high beam quality can be realized in the DUV region [1]. To perform appropriate processing for various materials, optimization of processing parameters is essential. Particularly, the laser pulse shape is an important parameter. We are developing a pulse-shape-controlled hybrid ArF laser based on the variable pulse shape solod-state DUV seed source.