Miniaturized Two-photon Lithography Platform via Metasurface

Two-photon lithography (TPL) was widely used in fabricating functional materials and micro/nano devices. However, the substantial cost, complexity, and bulkiness of the optical systems required for TPL present significant barriers to its widespread adoption [1], thus limiting its development and application. Moreover, certain specialized applications necessitate the integration of multiple fabrication strategies, such as the cross-scale structures that combine nanometer-level feature size with centimeter-scale dimensions. Traditional TPL systems are typically designed for a single operational mode, requiring extensive adjustments and recalibration of optical components when switching functions, which is both complex and time-consuming. Metasurfaces are particularly well-suited to address the challenges currently faced by TPL, owing to their compact size, multi-dimensional modulation capabilities, and design flexibility [2].