Generation of High-Energy Laser Pulses at 266 nm with Sub-Nanosecond Pulse Duration and 20 Hz Repetition Rate
High-energy and high-peak-power UV lasers have gained attention recently due to their suitability for microfabrication. We developed a high-energy laser system using a microchip laser with a sub-nanosecond pulse duration and power amplifiers employing Distributed Faced Cooling [1], achieving pulse energies exceeding 2 J at a repetition rate of20 Hz. This report presents the results of wavelength conversion based on this laser, achieving 266 nm in the Deep UV (DUV) range.
Authors
- Hideho Odaka (ORCID: https://orcid.org/0000-0003-0421-1393)
- Vincent Yahia
- Takunori Taira (ORCID: https://orcid.org/0000-0003-2512-7836)
- Kenichi Hirosawa (ORCID: https://orcid.org/0009-0006-7030-0860)
- Nobuo Ohata (ORCID: https://orcid.org/0000-0002-6446-7959)
- Arvydas Kausas (ORCID: https://orcid.org/0000-0003-2782-060X)
Institutions
- Institute for Laser Technology (JP)
- Mitsubishi Electric (Japan) (JP)
- Campbell Collaboration (NO)
Publication Details
- Published
- 2025-06-23
- DOI
- https://doi.org/10.1109/cleo/europe-eqec65582.2025.11110255
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00