High-Power Micro-Transfer Printed 796 nm Fabry-Perot Laser
A recent push has been made towards the heterogeneous integration of laser sources at wavelengths around 800 nm through wafer bonding [1], [2]. However, for nonlinear applications such as microcomb generation for spectroscopy and absolute frequency referencing in atomic clocks, higher-power integrated laser sources are required. The main power limitation inherent to wafer bonded lasers is the low thermal conductivity of the silicon oxide layer between the heat-generating III-V layers and the silicon substrate, leading to thermal roll-off. To avoid this problem, the superior flexibility of micro-transfer printing can be used to directly print III-V laser sources on the silicon substrate in recesses etched in silicon nitride (SiN) photonic-integrated circuits [3], vertically aligning the III-V mode with the silicon nitride waveguide and facilitating greatly improved thermal characteristics. In this work, we show the fabrication of micro-transfer printable edge-emitting Fabry-Perot laser coupons. These coupons are successfully printed on a silicon substrate, showing high laser power (> 70 mW at 150 mA) around 795 nm without thermal roll-off.
Authors
- Max Kiewiet (ORCID: https://orcid.org/0000-0002-9451-7080)
- Stijn Cuyvers (ORCID: https://orcid.org/0000-0002-0943-9779)
- Kasper Van Gasse (ORCID: https://orcid.org/0000-0002-4286-585X)
- Bart Kuyken (ORCID: https://orcid.org/0000-0002-8745-7833)
- M. L. Billet (ORCID: https://orcid.org/0000-0002-3823-6639)
Institutions
- Ghent University (BE)
Publication Details
- Published
- 2025-06-23
- DOI
- https://doi.org/10.1109/cleo/europe-eqec65582.2025.11109087
- Primary Topic
- Laser Material Processing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00