Projecting Multiphase Holograms for Maskless Lithography
Holography is a diffractive method to record and reconstruct wavefronts using both amplitude and phase information of light. Compared to conventional imaging optics, holography offers greater control on light using computational methods and robust corrections[1]–[3]. This allows using simpler optical setups with fewer physical components, easier methods of alignment and delocalised aberration corrections[4]. In this work we discuss how multiphase computer-generated holograms (CGH) displayed on liquid crystal on silicon (LCOS) spatial light modulators (SLM) can be used to perform maskless lithography by reconstructing custom targets.
Authors
- Amitava Rakshit (ORCID: https://orcid.org/0000-0002-9406-8262)
- Hannah J. Joyce (ORCID: https://orcid.org/0000-0002-9737-680X)
- Oliver J. Burton (ORCID: https://orcid.org/0000-0002-2060-1714)
- Tim D. Wilkinson
- Antoni Wójcik (ORCID: https://orcid.org/0000-0003-4819-3457)
Institutions
- University of Cambridge (GB)
- Bridge University (SS)
Publication Details
- Published
- 2025-06-23
- DOI
- https://doi.org/10.1109/cleo/europe-eqec65582.2025.11111186
- Primary Topic
- Random lasers and scattering media
- Type
- article
- Field-Weighted Citation Impact
- 0.00