Photo-Induced Tunable Nanoimprint Lithography Stamps: Proof of Concept

Fabrication of tunable nanoimprint lithography (NIL) stamps and the experimental imprints as substructuring triangular or rectangular mesa, are presented for the first time as a proof of principle. During subsequent imprints, size and shape of stamp structures were actively modified through external stimuli, such as light.

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Published
2025-07-13
DOI
https://doi.org/10.1109/omn65869.2025.11125934
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
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article

Photo-Induced Tunable Nanoimprint Lithography Stamps: Proof of Concept

Burhan Kaban, Eireen Käkel, J. Lindner, Thomas Fuhrmann‐Lieker et al.
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Nanofabrication and Lithography Techniques
article

Photo-Induced Tunable Nanoimprint Lithography Stamps: Proof of Concept

Burhan Kaban, Eireen Käkel, J. Lindner, Thomas Fuhrmann‐Lieker, Hartmut Hillmer, Sekvan Bagatur
article en

Abstract

Fabrication of tunable nanoimprint lithography (NIL) stamps and the experimental imprints as substructuring triangular or rectangular mesa, are presented for the first time as a proof of principle. During subsequent imprints, size and shape of stamp structures were actively modified through external stimuli, such as light.

University of Kassel (DE)
Openalex Percentile: Top 79%
Nanofabrication and Lithography Techniques
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