Atmospheric-pressure plasma-induced formation of heterostructured thick silicon films toward high energy density lithium-ion battery anodes

Abstract The significant volume expansion of silicon (Si) anodes during lithiation and delithiation cycles in lithium-ion batteries (LIBs) is a serious issue for their mechanical stability and long-term performance. Incorporating controlled voids and defects into the Si has emerged as a promising strategy to mitigate mechanical degradation during cycling. This study investigates the formation of highly defective, heterostructured Si thick films using atmospheric-pressure (AP) plasma-enhanced chemical vapor deposition (PECVD) driven by very-high-frequency (VHF) electric power. Structural and electrochemical analyses demonstrate that the resulting heterostructured Si anodes exhibit suppressed volumetric expansion and deliver an impressive initial volumetric capacity of 4217 mA h cm −3 . Our findings highlight the potential of the AP-PECVD process as a viable technique for producing high-performance Si anodes for future LIBs technologies.