Defect and electrical characteristics of 4H-SiC junction barrier Schottky diodes under high-energy electron irradiation at different fluences
Abstract This study investigates 1 MeV electron irradiation affects 4H-SiC junction barrier Schottky diodes by analyzing defects and electrical parameters. Current voltage ( I – V ) and capacitance voltage ( C – V ) measurements are used to extract parameters such as series resistance ( R s ), Schottky barrier height and carrier concentration. Defects were detected using deep-level transient spectroscopy, photoluminescence, and optically detected magnetic resonance. Results show that R s first decreases at low irradiation fluences because carbon interstitials ( I C ), silicon vacancies ( V Si ) and silicon interstitials ( I Si ) reduce carbon vacancy ( V C ) concentration, improving carrier mobility. At higher fluences, R s increases due to acceptor-level defects reducing carrier concentration. Reverse leakage current ( I r ) changes nonlinearly with fluence: (1) Generation-recombination current increases due to more V C , V Si , and complex defects in the bulk; (2) Thermionic emission and tunneling currents decrease. The combined effects lead to complex leakage behavior. V Si play a critical role in both defect compensation and recombination processes. This work provides practical guidance for designing radiation-resistant SiC devices in space applications.
Authors
- Wenlong Liu (ORCID: https://orcid.org/0000-0002-7186-3597)
- Mingxue Huo (ORCID: https://orcid.org/0000-0002-6644-8081)
- Yidan Tang (ORCID: https://orcid.org/0000-0003-3150-9873)
- Xiaoli Tian (ORCID: https://orcid.org/0000-0002-5503-2291)
- Jilong Hao (ORCID: https://orcid.org/0000-0001-9441-6223)
- Yun Bai (ORCID: https://orcid.org/0000-0003-3104-1393)
- Yiping Xiao (ORCID: https://orcid.org/0009-0000-5675-1928)
- Chaoming Liu (ORCID: https://orcid.org/0000-0001-8839-5729)
- Xuan Li (ORCID: https://orcid.org/0000-0002-6552-269X)
- Xinyu Liu (ORCID: https://orcid.org/0000-0003-0854-8559)
- Hu Zheng (ORCID: https://orcid.org/0000-0001-6055-7239)
Institutions
- Harbin Institute of Technology (CN)
- Institute of Microelectronics (SG)
- Institute of Microelectronics (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Journal of Physics D Applied Physics
- Published
- 2025-08-14
- DOI
- https://doi.org/10.1088/1361-6463/adfb89
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China