Direct Surface Pattern of Organic Crystals Based on Photoinduced Molecular Decomposition

Lithography technology, as a key process, has been widely applied in the patterning treatment of inorganic crystals, thus providing important support for the manufacturing of electronic devices. However, it has been a challenge to pattern organic single crystals, as they are fragile and soluble in the solvents used in conventional methods. Addressing these limitations, we develop a direct photolithography strategy for patterning organic single crystals of 5-((9-ethyl-9<i>H</i>-carbazol-3-yl)methylene)-2,2-dimethyl-1,3-dioxane-4,6-dione (5-CY MD), 2,2-dimethyl-5-(pyren-1-ylmethylene)-1,3-dioxane-4,6-dione (5-PYMD), and (<i>E</i>)-2,2-dimethyl-5-(3-(10-phenylanthracen-9-yl)allylidene)-1,3-dioxane-4,6-dione (5- PAYAD) without compromising structural integrity. Upon ultraviolet exposure, these photosensitive crystals undergo spatially controlled bond dissociation, thereby inducing localized molecular decomposition. This selective photomodification generates multiscale patterns while retaining crystallinity in unexposed regions. The novelty of this strategy lies in its simplicity and cost-effectiveness, eliminating the reliance on harsh solvents and laborious wet-processing steps. This work not only achieves high-quality results but also paves the way for systematic, controlled crystal patterning, advancing applications in semiconductor technology and beyond.