Field-Modulated Redistribution Mechanism of Trapped Charges From TID Irradiation and Experiments in SJ-LDMOS
A novel field-modulated redistribution (FR) mechanism of trapped charges from total ionizing dose (TID) irradiation is proposed and experimentally demonstrated in this article. The FR mechanism reveals the redistribution dynamics of irradiation-induced trapped charges at the Si/SiO<sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><roman>2</roman></sub> interface of high-voltage superjunction lateral double-diffused metal–oxide semiconductor (SJ-LDMOS), subject to varying electric field distributions resulting from different Drain biases. The lateral component of the electric field leads to the transport of irradiation-induced holes in the voltage-withstanding direction, while the vertical component facilitates the extraction of irradiation-induced holes. Ultimately, the movement of holes leads to the positive trapped charges are primarily located in the middle of the voltage-withstanding layer and vary with different applied biases. Based on the FR mechanism, a 700 V level SJ-LDMOS, which incorporates a source-side stepped field plate serving as a vertical field extraction structure, was designed and manufactured. The experiments demonstrated an irradiation withstand performance surpassing 150 krad(Si), corresponding to a condition where the channel remains permanently open. Under high voltage bias, the device exhibited an increase in breakdown voltage <italic xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">V</i><sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><i>B</i></sub> from an initial 750 V to about 785 V, accompanied by about 5% enhancement in current capability. This device demonstrates potential application in aerospace and deep-space exploration electronic systems.
Authors
- Bo Jiang
- Zhiqin Zhong (ORCID: https://orcid.org/0000-0003-2956-5921)
- Zixuan Chen
- Chaoming Liu (ORCID: https://orcid.org/0000-0001-8839-5729)
- Bo Zhang (ORCID: https://orcid.org/0000-0003-1288-1549)
- Zhao Quanyu
- Wentong Zhang (ORCID: https://orcid.org/0000-0001-9221-3318)
- Fajun Li (ORCID: https://orcid.org/0000-0002-3917-6519)
- Zhaoji Li (ORCID: https://orcid.org/0000-0002-2478-8897)
- Hongbo Li (ORCID: https://orcid.org/0000-0003-4410-586X)
- Cen Huang
- Gang Yao (ORCID: https://orcid.org/0009-0007-3125-6331)
Institutions
- University of Electronic Science and Technology of China (CN)
- Harbin Institute of Technology (CN)
- China Institute of Atomic Energy (CN)
- National Astronomical Observatories (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-08-20
- DOI
- https://doi.org/10.1109/ted.2025.3598239
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China