Characterizing Capacitor Top Plate Bias for More Accurate Electromagnetic Simulations

As frequencies increase, the use of smaller value metal-insulator-metal (MIM) capacitors increases. For small capacitors, errors due to the bias (as fabricated to as drawn difference) of the top plate can cause significant errors. This bias is not correctly monitored with resistance based W (RLWB) monitors and can be made worse if the resistive based RLWB is used. We present a simple capacitive based technique that uses only two test capacitors to determine the value of the capacitive linewidth bias (CLWB) that is more appropriate for use electromagnetic (EM) simulation and provides consistency with typical MIM compact models.

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Publication Details

Journal
IEEE Transactions on Semiconductor Manufacturing
Published
2025-08-20
DOI
https://doi.org/10.1109/tsm.2025.3600905
Citations
2
Primary Topic
Electromagnetic Compatibility and Noise Suppression
Type
article
Field-Weighted Citation Impact
1.46
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article

Characterizing Capacitor Top Plate Bias for More Accurate Electromagnetic Simulations

Leonard Hayden, P.J. Zampardi, Quinn Davenport
2 citations
IEEE Transactions on Semiconductor Manufacturing
Electromagnetic Compatibility and Noise Suppression
1.46
article

Characterizing Capacitor Top Plate Bias for More Accurate Electromagnetic Simulations

Leonard Hayden, P.J. Zampardi, Quinn Davenport
article en
2 citations

Abstract

As frequencies increase, the use of smaller value metal-insulator-metal (MIM) capacitors increases. For small capacitors, errors due to the bias (as fabricated to as drawn difference) of the top plate can cause significant errors. This bias is not correctly monitored with resistance based W (RLWB) monitors and can be made worse if the resistive based RLWB is used. We present a simple capacitive based technique that uses only two test capacitors to determine the value of the capacitive linewidth bias (CLWB) that is more appropriate for use electromagnetic (EM) simulation and provides consistency with typical MIM compact models.

IEEE Transactions on Semiconductor ManufacturingVol. 38(4)
Tabor College (US), Qorvo (United States) (US), Silicon Labs (United States) (US)
Affordable and clean energy
Openalex Percentile: Top 16%
Electromagnetic Compatibility and Noise Suppression
1.46
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