Wrinkle-Assisted Nanochannel Arrays Application for Nanoparticles

Resistive pulse sensing (RPS) detects nanoparticles via transient resistance changes during translocation through nanochannels, but conventional systems face issues like clogging, low-throughput, and complex fabrication. We present a wrinkle-assisted micro-/nanofluidic device (WMND) using scalable wrinkle lithography to form dense, uniform nanochannels. WMND detected particles as small as 200 nm, enhanced throughput, and reduced clogging by 89%. Fabrication time and cost droped by over 90%, while limit of detection reached 89 particles. Its high adaptability suited various applications in diagnostics, environmental, and chemical sensing, demonstrating WMND's potential as a next-generation nanoparticle detection platform.