MEMS Gas Sensor Arrays with Multilayer of Nanomaterials Patterned by Wafer-Level Photolithography Process

To address the challenge of low selectivity and poor scalability in MEMS gas sensors, we propose a wafer-level patterning method for integrating multilayer gas-sensing nanomaterials using photolithography processes. Ce-doped SnO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> nanosheets and WO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> nanoparticles were individually dispersed in photoresist and sequentially patterned onto interdigitated electrodes. The resulting sensor array exhibits excellent material uniformity and excellent responses to acetone and ethanol, respectively, with distinct response patterns enabling accurate gas type and concentration prediction using a Support Vector Machine model, showing promising potential for multi-target E-nose applications.