Micro-Transfer-Printed Silicon/Thin-Film Lithium Niobate Hybrid Mach-Zehnder Modulator with Low-Loss Inter-Layer Transition
A micro-transfer-printed silicon/thin-film lithium niobate (TFLN) Mach-Zehnder modulator is demonstrated, where firstly light is modulated in etched TFLN waveguides printed on silicon photonic platform with insertion loss of 1.0 dB and large bandwidth over 67 GHz. Keywords: Si photonic and heterogeneous platform, Thin film lithium niobate passive devices
Authors
- Toshiya Murai (ORCID: https://orcid.org/0000-0002-0990-7384)
- Guangwei Cong (ORCID: https://orcid.org/0000-0003-3519-635X)
- Yohei Yamashita
- Rai Kou (ORCID: https://orcid.org/0000-0002-1418-9137)
- Koji Yamada (ORCID: https://orcid.org/0000-0002-6478-8250)
- Masahiko Imai
- Kazumasa Takabayashi
Institutions
- Furukawa Electric (Japan) (JP)
- National Institute of Advanced Industrial Science and Technology (JP)
Publication Details
- Published
- 2025-06-29
- DOI
- https://doi.org/10.23919/oecc/psc62146.2025.11111361
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00