Thin-Film Scandium Aluminum Nitride Bulk Acoustic Resonator with High Q of 208 and K2 of 9.5% at 12.5 GHz
This work describes sputtered scandium aluminum nitride (ScAlN) thin-film bulk acoustic resonators (FBAR) at 12.5 GHz with high electromechanical coupling <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(k^{2})$</tex> of 9.5% and quality factor <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(Q)$</tex> of 208, resulting in a figure of merit (FoM, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$Q\cdot k^{2}$</tex>) of 19.8. ScAlN resonators employ a stack of 90 nm thick 20% Sc doping ScAlN piezoelectric film on the floating bottom 38 nm thick platinum (Pt) electrode to achieve low losses and high coupling toward centimeter wave (cmWave) frequency band operation. Three fabricated and FBARs are reported, show promising prospects of ScAlN-Pt stack towards cmWave front-end filters.
Authors
- Sinwoo Cho
- Tzu-Hsuan Hsu (ORCID: https://orcid.org/0000-0003-4606-1039)
- Lezli Matto (ORCID: https://orcid.org/0000-0002-5775-3703)
- Omar Barrera (ORCID: https://orcid.org/0009-0003-6157-1069)
- Ruochen Lu (ORCID: https://orcid.org/0000-0003-0025-3924)
- Ian Anderson (ORCID: https://orcid.org/0000-0003-2205-9209)
- Michael Evan Liao (ORCID: https://orcid.org/0000-0003-3103-9357)
- Vakhtang Chulukhadze (ORCID: https://orcid.org/0009-0003-6869-1231)
- Yinan Wang (ORCID: https://orcid.org/0000-0002-1558-960X)
- Jack J. Kramer
- Eugene Kwon (ORCID: https://orcid.org/0000-0003-0722-4915)
- Mark Goorksy
Institutions
- University of California, Los Angeles (US)
- The University of Texas at Austin (US)
Publication Details
- Published
- 2025-06-29
- DOI
- https://doi.org/10.1109/transducers61432.2025.11110376
- Citations
- 1
- Primary Topic
- Acoustic Wave Resonator Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.67
Funders
- Defense Advanced Research Projects Agency