Electron Beam Spot Intensity Uniformity Detection System Based on Suspended NANO Photographic Plates
This paper introduces a method for characterizing electron beam spot intensity uniformity based on suspended nano photographic plates. For the first time, both the beam spot intensity uniformity and shot size are simultaneously extracted by a detection system at 1.25 nm resolution. This approach makes it possible to evaluate the process uniformity and efficiency on wafers, which is beneficial for key parameter extraction and optimizing exposure schemes in fabrication of NEMS.
Authors
- Yuan Sheng (ORCID: https://orcid.org/0000-0002-8866-6928)
- Xuanqing Hua (ORCID: https://orcid.org/0000-0003-1856-5264)
- Peng Liu (ORCID: https://orcid.org/0000-0002-7958-1973)
- Dacheng Zhang (ORCID: https://orcid.org/0000-0002-9992-1058)
- Jiawei Zhou (ORCID: https://orcid.org/0000-0001-6209-9585)
- Fengjun Yu
Institutions
- Peking University (CN)
Publication Details
- Published
- 2025-06-29
- DOI
- https://doi.org/10.1109/transducers61432.2025.11109245
- Primary Topic
- Integrated Circuits and Semiconductor Failure Analysis
- Type
- article
- Field-Weighted Citation Impact
- 0.00