Low-Loss Amorphous-Si Strip-Loaded Thin Film Lithium Niobate on Insulator Waveguides with Compact Bending Radius
We investigate amorphous-silicon (a-Si) strip-loaded thin film lithium-niobate-on-insulator (TFLN) waveguides. We achieve <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\sim 2 ~\text{dB} / \text{cm}$</tex> propagation loss and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$0.085 ~\text{dB} / 90^{\circ}$</tex> bending loss for <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$20 \mu ~\mathrm{m}$</tex> radius.
Authors
- Nobuhiko Nishiyama (ORCID: https://orcid.org/0000-0001-8288-6690)
- Tsuyoshi Horikawa (ORCID: https://orcid.org/0000-0002-0084-0654)
- Yuki Nomoto
- Yoshitaka Ohiso
- Masahiko Namerikawa
- Moataz Eissa (ORCID: https://orcid.org/0000-0002-4339-2724)
- Kensuke Ogawa (ORCID: https://orcid.org/0000-0003-0881-9160)
- Shoichiro Yamaguchi
Institutions
- Tokyo Institute of Technology (JP)
- NGK Insulators (Japan) (JP)
Publication Details
- Published
- 2025-06-29
- DOI
- https://doi.org/10.23919/oecc/psc62146.2025.11111058
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00