Design-for-manufacture and assembly of an all-reflective freeform microscope objective

All-reflective microscope objectives offer significant benefits for microscopy techniques that operate across widely separated spectral bands. However, designing a high-numerical aperture, unobscured, all-reflective microscope objective suitable for manufacture presents substantial challenges and demands the early integration of manufacturing considerations into the optical design process. In this work, we develop and apply design-for-manufacture strategies for a 0.65 numerical aperture all-reflective microscope objective leveraging freeform optics, including desensitization optimization and stray light analyses. Concepts for mounting and assembly are introduced and implemented, culminating in the successful fabrication of a complete objective system.

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Publication Details

Published
2025-08-18
DOI
https://doi.org/10.1364/opticaopen.29922719.v1
Citations
1
Primary Topic
Advancements in Photolithography Techniques
Type
article
Field-Weighted Citation Impact
0.73
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Design-for-manufacture and assembly of an all-reflective freeform microscope objective

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Design-for-manufacture and assembly of an all-reflective freeform microscope objective

Jannick P. Rolland, Aaron Bauer, Matthew Ferguson, Adam M. Hanninen, Eric O. Potma, Daniel K. Nikolov, Stephan Clark
article en
1 citations

Abstract

All-reflective microscope objectives offer significant benefits for microscopy techniques that operate across widely separated spectral bands. However, designing a high-numerical aperture, unobscured, all-reflective microscope objective suitable for manufacture presents substantial challenges and demands the early integration of manufacturing considerations into the optical design process. In this work, we develop and apply design-for-manufacture strategies for a 0.65 numerical aperture all-reflective microscope objective leveraging freeform optics, including desensitization optimization and stray light analyses. Concepts for mounting and assembly are introduced and implemented, culminating in the successful fabrication of a complete objective system.

Openalex Percentile: Top 25%
Advancements in Photolithography Techniques
0.73
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