Damage-free lift-off of epitaxial HgCdTe thin films for future curved infrared imaging array applications

• MBE growth of high-quality MWIR HgCdTe on CdZnTe substrate with a 10 nm MgTe sacrificial layer. • Successful demonstration of damage-free epitaxial lift-off and transfer of HgCdTe thin films. • Lifted-off HgCdTe photoconductor shows a peak responsivity of 1080 V / W and detectivity of 3.3 × 10 10 Jones at 77 K. • Lift-off process preserves HgCdTe thin films material quality and optoelectronic performance. • Epitaxial lift-off enables high-quality free-standing HgCdTe thin films for curved infrared IR arrays. This paper presents a study on the molecular beam epitaxial (MBE) growth of H g 0.72 C d 0.28 T e thin film materials on C d 0.96 Z n 0.04 T e (2 1 1)B substrates, incorporating a 10 nm thick MgTe sacrificial layer for subsequent lift-off. The H g 0.72 C d 0.28 T e thin films present a full width at half maximum of 31 arc sec for the X-ray diffraction rocking curve and a root-mean-square surface roughness of 1.2 nm. Additionally, this study developed and characterised an epitaxial lift-off process for the HgCdTe epilayers. The HgCdTe epilayers were successfully lifted-off from the substrate by adhering them to a silicon substrate and immersing in deionized water to dissolve the MgTe sacrificial layer. After lift-off, the samples exhibited p-type conduction with a carrier concentration of 2.01 × 10 15 c m - 3 and a hall mobility of 1.96 × 10 2 c m 2 / V · s at 77 K. Following the epitaxial lift-off process, photoconductors were fabricated on the HgCdTe thin films, which demonstrated a peak responsivity of 1080 V / W and a peak detectivity of 3.3 × 10 10 Jones at 77 K at the wavelength of 5.4 µm. The minority carrier lifetime was measured to be around 1.15 µs at 77 K. A scanned imaging system was constructed to assess the infrared imaging performance of the photoconductor. These results were then compared with those of a photoconductor fabricated on HgCdTe thin films without the epitaxial lift-off process, and indicated that the lift-off process has minimal impact on the optoelectronic properties of the thin film and on device performance. These findings validate the feasibility of producing high quality, free-standing HgCdTe thin films for future applications in curved imaging arrays.

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Publication Details

Journal
Infrared Physics & Technology
Published
2025-08-18
DOI
https://doi.org/10.1016/j.infrared.2025.106073
Citations
1
Primary Topic
Advanced Semiconductor Detectors and Materials
Type
article
Field-Weighted Citation Impact
0.73
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article

Damage-free lift-off of epitaxial HgCdTe thin films for future curved infrared imaging array applications

Gilberto A. Umana‐Membreno, Xiao Sun, Kaijian Xing, L. Faraone et al.
1 citations
Infrared Physics & Technology
Advanced Semiconductor Detectors and Materials
0.73
article

Damage-free lift-off of epitaxial HgCdTe thin films for future curved infrared imaging array applications

Gilberto A. Umana‐Membreno, Xiao Sun, Kaijian Xing, L. Faraone, Wen Lei, Michael S. Fuhrer, Shuo Ma, Wenwu Pan, Renjie Gu, H Kala, Zekai Zhang
article en
1 citations

Abstract

• MBE growth of high-quality MWIR HgCdTe on CdZnTe substrate with a 10 nm MgTe sacrificial layer. • Successful demonstration of damage-free epitaxial lift-off and transfer of HgCdTe thin films. • Lifted-off HgCdTe photoconductor shows a peak responsivity of 1080 V / W and detectivity of 3.3 × 10 10 Jones at 77 K. • Lift-off process preserves HgCdTe thin films material quality and optoelectronic performance. • Epitaxial lift-off enables high-quality free-standing HgCdTe thin films for curved infrared IR arrays. This paper presents a study on the molecular beam epitaxial (MBE) growth of H g 0.72 C d 0.28 T e thin film materials on C d 0.96 Z n 0.04 T e (2 1 1)B substrates, incorporating a 10 nm thick MgTe sacrificial layer for subsequent lift-off. The H g 0.72 C d 0.28 T e thin films present a full width at half maximum of 31 arc sec for the X-ray diffraction rocking curve and a root-mean-square surface roughness of 1.2 nm. Additionally, this study developed and characterised an epitaxial lift-off process for the HgCdTe epilayers. The HgCdTe epilayers were successfully lifted-off from the substrate by adhering them to a silicon substrate and immersing in deionized water to dissolve the MgTe sacrificial layer. After lift-off, the samples exhibited p-type conduction with a carrier concentration of 2.01 × 10 15 c m - 3 and a hall mobility of 1.96 × 10 2 c m 2 / V · s at 77 K. Following the epitaxial lift-off process, photoconductors were fabricated on the HgCdTe thin films, which demonstrated a peak responsivity of 1080 V / W and a peak detectivity of 3.3 × 10 10 Jones at 77 K at the wavelength of 5.4 µm. The minority carrier lifetime was measured to be around 1.15 µs at 77 K. A scanned imaging system was constructed to assess the infrared imaging performance of the photoconductor. These results were then compared with those of a photoconductor fabricated on HgCdTe thin films without the epitaxial lift-off process, and indicated that the lift-off process has minimal impact on the optoelectronic properties of the thin film and on device performance. These findings validate the feasibility of producing high quality, free-standing HgCdTe thin films for future applications in curved imaging arrays.

Infrared Physics & TechnologyVol. 151
Curtin University (AU), ARC Centre of Excellence in Future Low-Energy Electronics Technologies (AU), ARC Centre of Excellence for Transformative Meta-Optical Systems (AU), Monash University (AU)
Openalex Percentile: Top 25%
Advanced Semiconductor Detectors and Materials
0.73
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