A Trench Heterojunction Diode-Integrated 4H-SiC LDMOS with Enhanced Reverse Recovery Characteristics

In this paper, a novel 4H-SiC LDMOS structure with a trench heterojunction in the source (referred as to THD-LDMOS) is proposed and investigated for the first time, to enhance the reverse recovery performance of its parasitic diode. Compared with 4H-SiC, silicon has a smaller band energy, which results in a lower built-in potential for the junction formed by P+ polysilicon and a 4N-SiC N-drift region. A trench P+ polysilicon is introduced in the source side, forming a heterojunction with the N-drift region, and this heterojunction is unipolar and connected in parallel with the body PiN diode. When the LDMOS operates as a freewheeling diode, the trench heterojunction conducts first, preventing the parasitic PiN from turning on and thereby significantly reducing the number of carriers in the N-drift region. Consequently, THD-LDMOS exhibits superior reverse recovery characteristics. The simulation results indicate that the reverse recovery peak current and reverse recovery charge of THD-LDMOS are reduced by 55.5% and 77.6%, respectively, while the other basic electrical characteristics remains unaffected.