Calibration-free low-drift MEMS piezoelectric accelerometer for high-temperature vibration monitoring
• Calibration-free MEMS piezoelectric accelerometer with ultra-low drift of 0.015%/°C. • Thermal stress isolation design reduces temperature drift by a factor of 16. • Thermally stable Sc doped AlN piezoelectric material up to 600 °C. • Stable vibration monitoring under extreme temperature and harsh environments. Micro-electro-mechanical system (MEMS) piezoelectric accelerometers offer distinct advantages, including being miniaturized, cost-effective and uniform. However, these accelerometers face challenges with stability and long-term reliability when applied to high-temperature and harsh environments such as oil and gas extraction. To address this issue, this paper focuses on wide-bandgap Sc-doped AlN (AlScN) piezoelectric thin films and a thermal stress isolation design to develop a calibration-free, thermally stable piezoelectric MEMS accelerometer. Firstly, a piezoelectric MEMS accelerometer with wide bandwidth, large range and high linearity is designed by Finite Element Method (FEM). Secondly, the crystallographic, electrical parameters and long-term aging of AlScN at high temperature were systematically characterized, which demonstrated its excellent high-temperature performance. Finally, the mechanism of sensitivity temperature drift was clarified by combining material properties and packaging structure. By designing an on-chip stress isolation structure, the temperature drift of the accelerometer was reduced by 16 times, achieving a piezoelectric MEMS accelerometer with an upper cutoff frequency of 8000 Hz, a range of 500 g, and a low sensitivity temperature coefficient of 0.015 %/°C, enabling stable vibration monitoring under extreme environments without additional calibration procedures.
Authors
- Jiachang Zhang (ORCID: https://orcid.org/0000-0002-6636-0135)
- Feng Tian (ORCID: https://orcid.org/0000-0002-6598-419X)
- Jiaqi Huang
- Yongquan Su (ORCID: https://orcid.org/0000-0002-1116-8373)
- Dalong Chen (ORCID: https://orcid.org/0000-0001-7093-3154)
- Hao Huang (ORCID: https://orcid.org/0000-0003-3151-367X)
- Yang Wang (ORCID: https://orcid.org/0000-0002-0688-0550)
- Yichen Liu (ORCID: https://orcid.org/0000-0002-6681-5582)
- Zhenyu Wu (ORCID: https://orcid.org/0000-0002-8572-8652)
- Cheng Zhang
- Lihao Wang (ORCID: https://orcid.org/0000-0002-4960-015X)
- Anna Li (ORCID: https://orcid.org/0000-0002-4180-6153)
Institutions
- Shanghai University (CN)
- Chinese Academy of Sciences (CN)
- State Key Laboratory of Transducer Technology (CN)
- Asociación Mexicana de Psicología y Desarrollo Comunitario (MX)
- Shanghai Industrial Technology Institute (CN)
- Shanghai Institute of Microsystem and Information Technology (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Measurement
- Published
- 2025-08-11
- DOI
- https://doi.org/10.1016/j.measurement.2025.118694
- Citations
- 3
- Primary Topic
- Acoustic Wave Resonator Technologies
- Type
- article
- Field-Weighted Citation Impact
- 2.02