Heat Conduction Modulation in Incommensurate Twisted Stacking of Transition‐Metal Dichalcogenide (Adv. Funct. Mater. 32/2025)

Transition-Metal Dichalcogenides In article number 2422761, Junichiro Shiomi and co-workers systematically investigates the twist-angle-dependent interlayer thermal conductance in bilayer WS2 and MoS2. The findings reveal a significant reduction in conductance as the twist angle shifts from commensurate to incommensurate configurations, with sharp variations near commensurate angles. This behavior arises from changes in interlayer interactions and vibrational-density overlaps, providing new insights into thermal management strategies for TMD-based devices.

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Publication Details

Journal
Advanced Functional Materials
Published
2025-08-01
DOI
https://doi.org/10.1002/adfm.70711
Citations
1
Primary Topic
Chalcogenide Semiconductor Thin Films
Type
article
Field-Weighted Citation Impact
0.73
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Heat Conduction Modulation in Incommensurate Twisted Stacking of Transition‐Metal Dichalcogenide (Adv. Funct. Mater. 32/2025)

Satoru Masubuchi, Tomoki Machida, Junichiro Shiomi, Meng An et al.
1 citations
Advanced Functional Materials
Chalcogenide Semiconductor Thin Films
0.73
article

Heat Conduction Modulation in Incommensurate Twisted Stacking of Transition‐Metal Dichalcogenide (Adv. Funct. Mater. 32/2025)

Satoru Masubuchi, Tomoki Machida, Junichiro Shiomi, Meng An, Yuanzhe Li, Bin Xu, Rulei Guo
article en
1 citations

Abstract

Transition-Metal Dichalcogenides In article number 2422761, Junichiro Shiomi and co-workers systematically investigates the twist-angle-dependent interlayer thermal conductance in bilayer WS2 and MoS2. The findings reveal a significant reduction in conductance as the twist angle shifts from commensurate to incommensurate configurations, with sharp variations near commensurate angles. This behavior arises from changes in interlayer interactions and vibrational-density overlaps, providing new insights into thermal management strategies for TMD-based devices.

Advanced Functional MaterialsVol. 35(32)
The University of Tokyo (JP)
Openalex Percentile: Top 25%
Chalcogenide Semiconductor Thin Films
0.73
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